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Photomask
A photomask is an opaque plate with holes or transparencies that allow light to shine through in a defined pattern. They are commonly used in photolithography and the production of integrated circuits (ICs or "chips") in particular. Masks are used to produce a pattern on a substrate, normally a thin slice of silicon known as a wafer in the case of chip manufacturing. Several masks are used in turn, each one reproducing a layer of the completed design, and together they are known as a mask set. Previously, photomasks used to be produced manually by using rubylith and mylar. As complexity continued to grow, manual processing of any sort became difficult. This was solved with the introduction of the optical pattern generator which automated the process of producing the initial large-scale pattern, and the step-and-repeat cameras that automated the copying of the pattern into a multiple-IC mask. The intermediate masks are known as reticles, and were initially copied to production ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Extreme Ultraviolet Lithography
Extreme ultraviolet lithography (also known as EUV or EUVL) is an optical Photolithography, lithography technology used in steppers, machines that make integrated circuits (ICs) for computers and other electronic devices. It uses a range of extreme ultraviolet (EUV) wavelengths, roughly spanning a 2% Full width at half maximum, FWHM bandwidth about 13.5Nanometre, nm, to produce a pattern by exposing reflective photomask to UV light which gets reflected onto a substrate covered by photoresist. It is widely applied in semiconductor device fabrication process. As of 2022, ASML Holding is the only company who produces and sells EUV systems for chip production, targeting 5 nm and 3 nm. At the 2019 International Electron Devices Meeting (IEDM), TSMC reported use of EUV for 5 nm in contact, via, metal line, and cut layers, where the cuts can be applied to fins, gates or metal lines. At IEDM 2020, TSMC reported their 5 nm minimum metal pitch to be reduced 30% from ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Photolithography
In integrated circuit manufacturing, photolithography or optical lithography is a general term used for techniques that use light to produce minutely patterned thin films of suitable materials over a substrate, such as a silicon wafer (electronics), wafer, to protect selected areas of it during subsequent etching, Chemical vapor deposition, deposition, or Ion implantation, implantation operations. Typically, ultraviolet light is used to transfer a geometry, geometric design from an photomask, optical mask to a photosensitivity, light-sensitive chemical (photoresist) coated on the substrate. The photoresist either breaks down or hardens where it is exposed to light. The patterned film is then created by removing the softer parts of the coating with appropriate solvents. Conventional photoresists typically consists of three components: resin, sensitizer, and solvent. Photolithography processes can be classified according to the type of light used, such as ultraviolet, deep ultrav ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Rubylith
image:Rubylith two rolls 2012.jpg, 200px, Rolls of lithographer's tape (these rolls are made by 3M). The roll in the back is 1/4 inch, the one in the front, 1/2 inch width. These products are often called "Rubylith" tape because Rubylith has become a generic term for coloured masking films. Rubylith is a brand of Photomask, masking film, invented and trademarked by the Ulano Corporation. Today the brand has become Genericized trademark, genericized to the point that it has become synonymous with all coloured masking films. Rubylith consists of two films sandwiched together. The bottom layer is a clear polyester backing sheet; the top layer is a translucent, red-(ruby-)coloured, sheet. The top layer can be cut and peeled away from the bottom layer. The top layer's colour is light-safe for orthochromatic films (which are sensitive to blue and green light but insensitive to red light). Rubylith is used in many areas of graphic design, typically to produce masks for various printin ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Electron Beam Lithography
Electron-beam lithography (often abbreviated as e-beam lithography, EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). The electron beam changes the solubility of the resist, enabling selective removal of either the exposed or non-exposed regions of the resist by immersing it in a solvent (developing). The purpose, as with photolithography, is to create very small structures in the resist that can subsequently be transferred to the substrate material, often by etching. The primary advantage of electron-beam lithography is that it can draw custom patterns (direct-write) with sub-10 nm resolution. This form of maskless lithography has high resolution and low throughput, limiting its usage to photomask fabrication, low-volume production of semiconductor devices, and research and development. Systems Electron-beam lithography systems used in commercial applicatio ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Semiconductor Photomask
A semiconductor is a material which has an electrical conductivity value falling between that of a conductor, such as copper, and an insulator, such as glass. Its resistivity falls as its temperature rises; metals behave in the opposite way. Its conducting properties may be altered in useful ways by introducing impurities ("doping") into the crystal structure. When two differently doped regions exist in the same crystal, a semiconductor junction is created. The behavior of charge carriers, which include electrons, ions, and electron holes, at these junctions is the basis of diodes, transistors, and most modern electronics. Some examples of semiconductors are silicon, germanium, gallium arsenide, and elements near the so-called "metalloid staircase" on the periodic table. After silicon, gallium arsenide is the second-most common semiconductor and is used in laser diodes, solar cells, microwave-frequency integrated circuits, and others. Silicon is a critical element for fabri ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Photographic Film
Photographic film is a strip or sheet of transparent film base coated on one side with a gelatin emulsion containing microscopically small light-sensitive silver halide crystals. The sizes and other characteristics of the crystals determine the sensitivity, contrast, and resolution of the film. The emulsion will gradually darken if left exposed to light, but the process is too slow and incomplete to be of any practical use. Instead, a very short exposure to the image formed by a camera lens is used to produce only a very slight chemical change, proportional to the amount of light absorbed by each crystal. This creates an invisible latent image in the emulsion, which can be chemically developed into a visible photograph. In addition to visible light, all films are sensitive to ultraviolet light, X-rays, gamma rays, and high-energy particles. Unmodified silver halide crystals are sensitive only to the blue part of the visible spectrum, producing unnatural-looking rendit ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Plotter
A plotter is a machine that produces vector graphics drawings. Plotters draw lines on paper using a pen, or in some applications, use a knife to cut a material like vinyl or leather. In the latter case, they are sometimes known as a cutting plotter. In the past, plotters were used in applications such as computer-aided design, as they were able to produce line drawings much faster and of a higher quality than contemporary conventional printers. Smaller desktop plotters were often used for business graphics. Printers with graphics capabilities took away some of the market by the early 1980s, and the introduction of laser printers in the mid-1980s largely eliminated the use of plotters from most roles. Plotters retained a niche for producing very large drawings for many years, but have now largely been replaced by wide-format conventional printers. Cutting plotters remain in use in a number of industries. Overview Digitally controlled plotters evolved from earlier fully ana ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Drafting Table
A drawing board (also drawing table, drafting table or architect's table) is, in its antique form, a kind of multipurpose desk which can be used for any kind of drawing, writing or impromptu sketching on a large sheet of paper or for reading a large format book or other oversized document or for drafting precise technical illustrations (such as engineering drawings or architectural drawings). The drawing table used to be a frequent companion to a pedestal desk in a study or private library, during the pre-industrial and early industrial era. During the Industrial Revolution, draftsmanship gradually became a specialized trade and drawing tables slowly moved out of the libraries and offices of most gentlemen. They became more utilitarian and were built of steel and plastic instead of fine woods and brass. More recently, engineers and draftsmen use the drawing board for making and modifying drawings on paper with ink or pencil. Different drawing instruments ( set square, protracto ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Stepper
A stepper is a device used in the manufacture of integrated circuits (ICs) that is similar in operation to a slide projector or a photographic enlarger. ''Stepper'' is short for step-and-repeat camera. Steppers are an essential part of the complex process, called photolithography, which creates millions of microscopic circuit elements on the surface of chips of silicon. These chips form the heart of ICs such as computer processors, memory chips, and many other devices. The stepper emerged in the late 1970s but did not become widespread until the 1980s. This was because it was replacing an earlier technology, the mask aligner. Aligners imaged the entire surface of a wafer at the same time, producing many chips in a single operation. In contrast, the stepper imaged only one chip at a time, and was thus much slower to operate. The stepper eventually displaced the aligner when the relentless forces of Moore's Law demanded that smaller feature sizes be used. Because the stepper ima ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Node (semiconductor Fabrication)
Semiconductor device fabrication is the process used to manufacture semiconductor devices, typically integrated circuit (IC) chips such as modern computer processors, microcontrollers, and memory chips such as NAND flash and DRAM that are present in everyday electrical and electronic devices. It is a multiple-step sequence of photolithographic and chemical processing steps (such as surface passivation, thermal oxidation, planar diffusion and junction isolation) during which electronic circuits are gradually created on a wafer made of pure semiconducting material. Silicon is almost always used, but various compound semiconductors are used for specialized applications. The entire manufacturing process takes time, from start to packaged chips ready for shipment, at least six to eight weeks (tape-out only, not including the circuit design) and is performed in highly specialized semiconductor fabrication plants, also called foundries or fabs. All fabrication takes place insid ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Fused Silica
Fused quartz, fused silica or quartz glass is a glass consisting of almost pure silica (silicon dioxide, SiO2) in amorphous (non-crystalline) form. This differs from all other commercial glasses in which other ingredients are added which change the glasses' optical and physical properties, such as lowering the melt temperature. Fused quartz, therefore, has high working and melting temperatures, making it less desirable for most common applications. The terms fused quartz and fused silica are used interchangeably, but can refer to different manufacturing techniques, as noted below, resulting in different trace impurities. However fused quartz, being in the glassy state, has quite different physical properties compared to crystalline quartz. Due to its physical properties it finds specialty uses in semiconductor fabrication and laboratory equipment, for instance. Compared to other common glasses, the optical transmission of pure silica extends well into the ultraviolet and infra ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
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