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Difluorosilane
Difluorosilane is a gaseous chemical compound with formula SiH2F2. It can be considered as a derivative of silane with two hydrogen atoms replaced with fluorine. Production Difluorosilane can be made by fluorinating dichlorosilane with antimony trifluoride. :3 SiH2Cl2 + 2 SbF3 → 3 SiH2F2 + 2 SbCl3 Some is also made in a reaction of silicon tetrafluoride with hydrogen :SiF4 + 2 H2 → SiH2F2 + 2 HF Traces of difluorosilane are made when coal is burnt. Properties Difluorosilane is a gas with boiling point −77.8 °C, and a freezing point of −122 °C. It has no colour. The silicon–fluorine bond length in difluorosilane is 1.358 Å which is greater than that in fluorosilane but less than the length in trifluorosilane. Reactions In an electric discharge, hydrogen atoms are preferentially removed from the molecule and SiHF2SiHF2 is formed along with hydrogen. :2 SiH2F2 → SiHF2SiHF2 + H2 At elevated temperatures, difluorosilane can disproportionate by swapping ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Silane
Silane is an inorganic compound with chemical formula, . It is a colourless, pyrophoric, toxic gas with a sharp, repulsive smell, somewhat similar to that of acetic acid. Silane is of practical interest as a precursor to elemental silicon. Silane with alkyl groups are effective water repellents for mineral surfaces such as concrete and masonry. Silanes with both organic and inorganic attachments are used as coupling agents. Production Commercial-scale routes Silane can be produced by several routes. Typically, it arises from the reaction of hydrogen chloride with magnesium silicide: : Mg2Si + 4 HCl -> 2 MgCl2 + SiH4 It is also prepared from metallurgical-grade silicon in a two-step process. First, silicon is treated with hydrogen chloride at about 300 °C to produce trichlorosilane, HSiCl3, along with hydrogen gas, according to the chemical equation : Si + 3 HCl -> HSiCl3 + H2 The trichlorosilane is then converted to a mixture of silane and silicon tetrachloride: : 4 HS ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Fluorine
Fluorine is a chemical element with the symbol F and atomic number 9. It is the lightest halogen and exists at standard conditions as a highly toxic, pale yellow diatomic gas. As the most electronegative reactive element, it is extremely reactive, as it reacts with all other elements except for the light inert gases. Among the elements, fluorine ranks 24th in universal abundance and 13th in terrestrial abundance. Fluorite, the primary mineral source of fluorine which gave the element its name, was first described in 1529; as it was added to metal ores to lower their melting points for smelting, the Latin verb meaning 'flow' gave the mineral its name. Proposed as an element in 1810, fluorine proved difficult and dangerous to separate from its compounds, and several early experimenters died or sustained injuries from their attempts. Only in 1886 did French chemist Henri Moissan isolate elemental fluorine using low-temperature electrolysis, a process still employed for modern pr ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Dichlorosilane
Dichlorosilane, or DCS as it is commonly known, is a chemical compound with the formula H2SiCl2. In its major use, it is mixed with ammonia (NH3) in LPCVD chambers to grow silicon nitride in semiconductor processing. A higher concentration of DCS·NH3 (i.e. 16:1), usually results in lower stress nitride films. History Dichlorosilane was originally prepared in 1919 by the gas-phase reaction of monosilane, SiH4, with hydrogen chloride, HCl, and then reported by Stock and Somieski. It was found that in the gas phase, dichlorosilane will react with water vapor to give a gaseous monomeric prosiloxane, H2SiO. Prosiloxane polymerizes rapidly in the liquid phase and slowly in the gas phase, which results in liquid and solid polysiloxanes 2SiOsub>n. The liquid portion of the product, which is collected via vacuum distillation, becomes viscous and gelled at room temperature. Hydrolysis was done on a solution of H2SiCl2 in benzene by brief contact with water, and the molecular weight was ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Antimony Trifluoride
Antimony trifluoride is the inorganic compound with the formula SbF3. Sometimes called Swarts' reagent, is one of two principal fluorides of antimony, the other being SbF5. It appears as a white solid. As well as some industrial applications, it is used as a reagent in inorganic and organofluorine chemistry. Preparation and structure In solid SbF3, the Sb centres have octahedral molecular geometry and are linked by bridging fluoride ligands. Three Sb–F bonds are short (192 pm) and three are long (261 pm). Because it is a polymer, SbF3 is far less volatile than related compounds AsF3 and SbCl3. SbF3 is prepared by treating antimony trioxide with hydrogen fluoride: :Sb2O3 + 6 HF → 2 SbF3 + 3 H2O The compound is a mild Lewis acid, hydrolyzing slowly in water. With fluorine, it is oxidized to give antimony pentafluoride. :SbF3 + F2 → SbF5 Applications It is used as a fluorination reagent in organic chemistry. This application was reported by the B ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Silicon Tetrafluoride
Silicon tetrafluoride or tetrafluorosilane is a chemical compound with the formula Si F4. This colorless gas is notable for having a narrow liquid range: its boiling point is only 4 °C above its melting point. It was first prepared in 1771 by Carl Wilhelm Scheele by dissolving silica in hydrofluoric acid., later synthesized by John Davy in 1812. It is a tetrahedral molecule and is corrosive. Preparation is a by-product of the production of phosphate fertilizers wet process production, resulting from the attack of HF (derived from fluorapatite protonolysis) on silicates, which are present as impurities in the phosphate rocks. The hydrofluoric acid and silicon dioxide (SiO2) react to produce hexafluorosilicic acid: : 6 HF + SiO2 → H2SiF6 + 2 H2O In the laboratory, the compound is prepared by heating barium hexafluorosilicate (Ba iF6 above whereupon the solid releases volatile , leaving a residue of . : Alternatively, sodium hexafluorosilicate () may also be ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Hydrogen
Hydrogen is the chemical element with the symbol H and atomic number 1. Hydrogen is the lightest element. At standard conditions hydrogen is a gas of diatomic molecules having the formula . It is colorless, odorless, tasteless, non-toxic, and highly combustible. Hydrogen is the most abundant chemical substance in the universe, constituting roughly 75% of all normal matter.However, most of the universe's mass is not in the form of baryons or chemical elements. See dark matter and dark energy. Stars such as the Sun are mainly composed of hydrogen in the plasma state. Most of the hydrogen on Earth exists in molecular forms such as water and organic compounds. For the most common isotope of hydrogen (symbol 1H) each atom has one proton, one electron, and no neutrons. In the early universe, the formation of protons, the nuclei of hydrogen, occurred during the first second after the Big Bang. The emergence of neutral hydrogen atoms throughout the universe occurred about 370,000 ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Trifluorosilane
Trifluorosilane (silicon trifluoride) is the chemical compound with the formula F3 H Si. At standard temperature and pressure, trifluorosilane is a colorless gas. Note that the free radical F3 Si is often also referred to as trifluorosilane. Preparation Trifluorosilane has been purified and separated by low-temperature high-vacuum distillation. One preparation method involves products of the reaction between SbF3 and HSiCl3. HSiCl3 is obtained by copper catalyzed reaction between HCl and Silicon at 200-400 °C. Formation has also been reported in certain etching operations of silicon. Properties The electric dipole moment of trifluorosilane is 1.26 debye The debye (symbol: D) (; ) is a CGS unit (a non- SI metric unit) of electric dipole momentTwo equal and opposite charges separated by some distance constitute an electric dipole. This dipole possesses an electric dipole moment whose value is give .... The length of the silicon to fluorine bond is 1.555 Å, Si-H le ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Electric Discharge
An electric discharge is the release and transmission of electricity in an applied electric field through a medium such as a gas (ie., an outgoing flow of electric current through a non-metal medium).American Geophysical Union, National Research Council (U.S.). Geophysics Study Committee (1986) ''The earth's electrical environment''. National Academy Press, Washington, DC, p. 263. Applications The properties and effects of electric discharges are useful over a wide range of magnitudes. Tiny pulses of current are used to detect ionizing radiation in a Geiger–Müller tube. A low steady current can be used to illustrate the spectrum of gases in a gas-filled tube. A neon lamp is an example of a gas-discharge lamp, useful both for illumination and as a voltage regulator. A flashtube generates a short pulse of intense light useful for photography by sending a heavy current through a gas arc discharge. Corona discharges are used in photocopiers. Electric discharges can convey substan ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Hydrogen
Hydrogen is the chemical element with the symbol H and atomic number 1. Hydrogen is the lightest element. At standard conditions hydrogen is a gas of diatomic molecules having the formula . It is colorless, odorless, tasteless, non-toxic, and highly combustible. Hydrogen is the most abundant chemical substance in the universe, constituting roughly 75% of all normal matter.However, most of the universe's mass is not in the form of baryons or chemical elements. See dark matter and dark energy. Stars such as the Sun are mainly composed of hydrogen in the plasma state. Most of the hydrogen on Earth exists in molecular forms such as water and organic compounds. For the most common isotope of hydrogen (symbol 1H) each atom has one proton, one electron, and no neutrons. In the early universe, the formation of protons, the nuclei of hydrogen, occurred during the first second after the Big Bang. The emergence of neutral hydrogen atoms throughout the universe occurred about 370,000 ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Chemical Vapour Deposition
Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber. Microfabrication processes widely use CVD to deposit materials in various forms, including: monocrystalline, polycrystalline, amorphous, and epitaxial. These materials include: silicon ( dioxide, carbide, nitride, oxynitride), carbon (fiber, nanofibers, nanotubes, diamond and graphene), fluorocarbons, filaments, tungsten, titanium nitride and various high-κ dielectrics. The term ''chemical vapour deposition'' was coined 1960 by ''John M. Blocher, Jr.'' who intended to differentiate ''chemic ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
