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Die Shrink
The term die shrink (sometimes optical shrink or process shrink) refers to the scaling of metal-oxide-semiconductor (MOS) devices. The act of shrinking a die is to create a somewhat identical circuit using a more advanced fabrication process, usually involving an advance of lithographic nodes. This reduces overall costs for a chip company, as the absence of major architectural changes to the processor lowers research and development costs while at the same time allowing more processor dies to be manufactured on the same piece of silicon wafer, resulting in less cost per product sold. Details Die shrinks are the key to improving price/performance at semiconductor companies such as Samsung, Intel, TSMC, and SK Hynix, and fabless manufacturers such as AMD (including the former ATI), NVIDIA and MediaTek. Examples in the 2000s include the downscaling of the PlayStation 2's Emotion Engine processor from Sony and Toshiba (from 180 nm CMOS in 2000 to 90 nm CMOS in 2003), t ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
List Of Semiconductor Scale Examples
Listed are many semiconductor scale examples for various metal–oxide–semiconductor field-effect transistor (MOSFET, or MOS transistor) semiconductor manufacturing process nodes. Timeline of MOSFET demonstrations PMOS and NMOS CMOS (single-gate) Multi-gate MOSFET (MuGFET) Other types of MOSFET Commercial products using micro-scale MOSFETs Products featuring 20 μm manufacturing process * RCA's CD4000 series of integrated circuits (ICs) beginning in 1968. Products featuring 10 μm manufacturing process * Intel 4004, the first single-chip microprocessor CPU, launched in 1971. * Intel 8008 CPU launched in 1972. * MOS Technology 6502 1 MHz CPU launched in 1975 (8 μm). Products featuring 8 μm manufacturing process * Intel 1103, an early dynamic random-access memory (DRAM) chip launched in 1970. Products featuring 6 μm manufacturing process * Toshiba TLCS-12, a microprocessor developed for the Ford EEC (Electronic Engine C ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
PlayStation 2
The PlayStation 2 (PS2) is a home video game console developed and marketed by Sony Computer Entertainment. It was first released in Japan on 4 March 2000, in North America on 26 October 2000, in Europe on 24 November 2000, and in Australia on 30 November 2000. It is the successor to the original PlayStation (console), PlayStation, as well as the second installment in the PlayStation brand of consoles. As a sixth generation of video game consoles, sixth-generation console, it competed with Nintendo's GameCube, and Microsoft's Xbox (console), Xbox. It is the List of best-selling game consoles, best-selling video game console of all time, having sold over 155 million units worldwide. Announced in 1999, Sony began developing the console after the immense success of its predecessor. The PS2 offered Backward compatibility, backward-compatibility for its predecessor's DualShock#DualShock, DualShock controller, as well as its games. The PlayStation 2 received widespread critical accla ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Graphics Processing Unit
A graphics processing unit (GPU) is a specialized electronic circuit designed to manipulate and alter memory to accelerate the creation of images in a frame buffer intended for output to a display device. GPUs are used in embedded systems, mobile phones, personal computers, workstations, and game consoles. Modern GPUs are efficient at manipulating computer graphics and image processing. Their parallel structure makes them more efficient than general-purpose central processing units (CPUs) for algorithms that process large blocks of data in parallel. In a personal computer, a GPU can be present on a video card or embedded on the motherboard. In some CPUs, they are embedded on the CPU die. In the 1970s, the term "GPU" originally stood for ''graphics processor unit'' and described a programmable processing unit independently working from the CPU and responsible for graphics manipulation and output. Later, in 1994, Sony used the term (now standing for ''graphics processing unit'' ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Silicon On Insulator
In semiconductor manufacturing, silicon on insulator (SOI) technology is fabrication of silicon semiconductor devices in a layered silicon–insulator–silicon substrate, to reduce parasitic capacitance within the device, thereby improving performance. SOI-based devices differ from conventional silicon-built devices in that the silicon junction is above an electrical insulator, typically silicon dioxide or sapphire (these types of devices are called silicon on sapphire, or SOS). The choice of insulator depends largely on intended application, with sapphire being used for high-performance radio frequency (RF) and radiation-sensitive applications, and silicon dioxide for diminished short-channel effects in other microelectronics devices. The insulating layer and topmost silicon layer also vary widely with application. Industry need SOI technology is one of several manufacturing strategies to allow the continued miniaturization of microelectronic devices, colloquially referred to as ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Athlon 64 X2
The Athlon 64 X2 is the first native dual-core desktop central processing unit (CPU) designed by Advanced Micro Devices (AMD). It was designed from scratch as native dual-core by using an already multi-CPU enabled Athlon 64, joining it with another functional core on one die, and connecting both via a shared dual-channel memory controller/north bridge and additional control logic. The initial versions are based on the E stepping model of the Athlon 64 and, depending on the model, have either 512 or 1024 KB of L2 cache per core. The Athlon 64 X2 can decode instructions for Streaming SIMD Extensions 3 (SSE3), except those few specific to Intel's architecture. The first Athlon 64 X2 CPUs were released in May 2005, in the same month as Intel's first dual-core processor, the Pentium D. In June 2007, AMD released low-voltage variants of their low-end 65 nm Athlon 64 X2, named "Athlon X2". The Athlon X2 processors feature reduced thermal design power (TDP) of 45 Watt (W). The name ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
45 nm
Per the International Technology Roadmap for Semiconductors, the 45 nm process is a MOSFET technology node referring to the average half-pitch of a memory cell manufactured at around the 2007–2008 time frame. Matsushita and Intel started mass-producing 45 nm chips in late 2007, and AMD started production of 45 nm chips in late 2008, while IBM, Infineon, Samsung, and Chartered Semiconductor have already completed a common 45 nm process platform. At the end of 2008, SMIC was the first China-based semiconductor company to move to 45 nm, having licensed the bulk 45 nm process from IBM. In 2008, TSMC moved on to a 40nm process. Many critical feature sizes are smaller than the wavelength of light used for lithography (i.e., 193 nm and 248 nm). A variety of techniques, such as larger lenses, are used to make sub-wavelength features. Double patterning has also been introduced to assist in shrinking distances between features, especially if dry lith ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Penryn (microarchitecture)
In Intel's Tick-Tock cycle, the 2007/2008 "Tick" was the shrink of the Core microarchitecture to 45 nanometers as CPUID model 23. In Core 2 processors, it is used with the code names Penryn (Socket P), Wolfdale (LGA 775) and Yorkfield (MCM, LGA 775), some of which are also sold as Celeron, Pentium and Xeon processors. In the Xeon brand, the Wolfdale-DP and Harpertown code names are used for LGA 771 based MCMs with two or four active Wolfdale cores. Architectural improvements over 65-nanometer Core 2 CPUs include a new divider with reduced latency, a new shuffle engine, and SSE4.1 instructions (some of which are enabled by the new single-cycle shuffle engine). Maximum L2 cache size per chip was increased from 4 to 6 MB, with L2 associativity increased from 16-way to 24-way. Cut-down versions with 3 MB L2 also exist, which are commonly called Penryn-3M and Wolfdale-3M as well as Yorkfield-6M, respectively. The single-core version of Penryn, listed as Penryn-L here, is not a sepa ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
65 nm
The 65 nm process is an advanced lithographic node used in volume CMOS (MOSFET) semiconductor fabrication. Printed linewidths (i.e. transistor gate lengths) can reach as low as 25 nm on a nominally 65 nm process, while the pitch between two lines may be greater than 130 nm. For comparison, cellular ribosomes are about 20 nm end-to-end. A crystal of bulk silicon has a lattice constant of 0.543 nm, so such transistors are on the order of 100 atoms across. Toshiba and Sony announced the 65 nm process in 2002, before Fujitsu and Toshiba began production in 2004, and then TSMC began production in 2005. By September 2007, Intel, AMD, IBM, UMC and Chartered were also producing 65 nm chips. While feature sizes may be drawn as 65 nm or less, the wavelengths of light used for lithography are 193 nm and 248 nm. Fabrication of sub-wavelength features requires special imaging technologies, such as optical proximity correction and pha ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Pentium 4
Pentium 4 is a series of single-core CPUs for desktops, laptops and entry-level servers manufactured by Intel. The processors were shipped from November 20, 2000 until August 8, 2008. The production of Netburst processors was active from 2000 until May 21, 2010. All Pentium 4 CPUs are based on the NetBurst microarchitecture. The Pentium 4 '' Willamette'' (180 nm) introduced SSE2, while the '' Prescott'' (90 nm) introduced SSE3. Later versions introduced Hyper-Threading Technology (HTT). The first Pentium 4-branded processor to implement 64-bit was the ''Prescott'' (90 nm) (February 2004), but this feature was not enabled. Intel subsequently began selling 64-bit Pentium 4s using the ''"E0" revision'' of the Prescotts, being sold on the OEM market as the Pentium 4, model F. The E0 revision also adds eXecute Disable (XD) (Intel's name for the NX bit) to Intel 64. Intel's official launch of Intel 64 (under the name EM64T at that time) in mainstream deskt ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
90 nm
The 90 nm process refers to the level of MOSFET (CMOS) fabrication process technology that was commercialized by the 2003–2005 timeframe, by leading semiconductor companies like Toshiba, Sony, Samsung, IBM, Intel, Fujitsu, TSMC, Elpida, AMD, Infineon, Texas Instruments and Micron Technology. The origin of the 90 nm value is historical, it reflects a trend of 70% scaling every 2–3 years. The naming is formally determined by the International Technology Roadmap for Semiconductors (ITRS). The 193 nm wavelength was introduced by many (but not all) companies for lithography of critical layers mainly during the 90 nm node. Yield issues associated with this transition (due to the use of new photoresists) were reflected in the high costs associated with this transition. Even more significantly, the 300 mm wafer size became mainstream at the 90 nm node. The previous wafer size was 200 mm diameter. History A 90nm silicon MOSFET was fabricated ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
CMOS
Complementary metal–oxide–semiconductor (CMOS, pronounced "sea-moss", ) is a type of metal–oxide–semiconductor field-effect transistor (MOSFET) fabrication process that uses complementary and symmetrical pairs of p-type and n-type MOSFETs for logic functions. CMOS technology is used for constructing integrated circuit (IC) chips, including microprocessors, microcontrollers, memory chips (including CMOS BIOS), and other digital logic circuits. CMOS technology is also used for analog circuits such as image sensors (CMOS sensors), data converters, RF circuits (RF CMOS), and highly integrated transceivers for many types of communication. The CMOS process was originally conceived by Frank Wanlass at Fairchild Semiconductor and presented by Wanlass and Chih-Tang Sah at the International Solid-State Circuits Conference in 1963. Wanlass later filed US patent 3,356,858 for CMOS circuitry and it was granted in 1967. commercialized the technology with the trademark "COS-MO ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
180 nm
The 180 nm process refers to the level of MOSFET (CMOS) semiconductor process technology that was commercialized around the 1998–2000 timeframe by leading semiconductor companies, starting with TSMC and Fujitsu, then followed by Sony, Toshiba, Intel, AMD, Texas Instruments and IBM. The origin of the 180 nm value is historical, as it reflects a trend of 70% scaling every 2–3 years. The naming is formally determined by the International Technology Roadmap for Semiconductors (ITRS). Some of the first CPUs manufactured with this process include Intel Coppermine family of Pentium III processors. This was the first technology using a gate length shorter than that of light used for contemporary lithography, which had a wavelength of 193 nm. Some more recent microprocessors and microcontrollers (e.g. PIC) are using this technology because it is typically low cost and does not require upgrading of existing equipment. In 2022, Google sponsored open-source ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
