Titanium disilicide (
Ti Si2) is an
inorganic chemical compound of
titanium and
silicon.
Preparation
Titanium disilicide can be obtained from the reaction between titanium or
titanium hydride with silicon.
:Ti + 2 Si → TiSi
2
It is also possible to prepare it
aluminothermically by the ignition of
aluminium powder,
sulfur
Sulfur (or sulphur in British English) is a chemical element with the symbol S and atomic number 16. It is abundant, multivalent and nonmetallic. Under normal conditions, sulfur atoms form cyclic octatomic molecules with a chemical formula ...
,
silicon dioxide, and
titanium dioxide or potassium hexafluorotitanate, K
2TiF
6, by electrolysis of a melt of potassium hexafluorotitanate and titanium dioxide, or by reaction of titanium with
silicon tetrachloride.
Another method is the reaction of
titanium tetrachloride with
silane,
dichlorosilane
Dichlorosilane, or DCS as it is commonly known, is a chemical compound with the formula H2SiCl2. In its major use, it is mixed with ammonia (NH3) in LPCVD chambers to grow silicon nitride in semiconductor processing. A higher concentration of DCS ...
or silicon.
:TiCl
4 + 2 SiH
4 → TiSi
2 + 4 HCl + 2 H
2
:TiCl
4 + 2 SiH
2Cl
2 + 2 H
2 → TiSi
2 + 8 HCl
:TiCl
4 + 3 Si → TiSi
2 + SiCl
4
Uses
Titanium silicide is used in the semiconductor industry. It is typically grown by means of
salicide technology over silicon and polysilicon lines to reduce the sheet resistance of local transistors connections.
In the microelectronic industry it is typically used in the C54 phase.
References
Transition metal silicides
Titanium(II) compounds
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