Photolitography
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Photolitography
In integrated circuit manufacturing, photolithography or optical lithography is a general term used for techniques that use light to produce minutely patterned thin films of suitable materials over a substrate, such as a silicon wafer, to protect selected areas of it during subsequent etching, deposition, or implantation operations. Typically, ultraviolet light is used to transfer a geometric design from an optical mask to a light-sensitive chemical ( photoresist) coated on the substrate. The photoresist either breaks down or hardens where it is exposed to light. The patterned film is then created by removing the softer parts of the coating with appropriate solvents. Conventional photoresists typically consists of three components: resin, sensitizer, and solvent. Photolithography processes can be classified according to the type of light used, such as ultraviolet, deep ultraviolet, extreme ultraviolet, or X-ray. The wavelength of light used determines the minimum fe ...
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Integrated Circuit
An integrated circuit or monolithic integrated circuit (also referred to as an IC, a chip, or a microchip) is a set of electronic circuits on one small flat piece (or "chip") of semiconductor material, usually silicon. Large numbers of tiny MOSFETs (metal–oxide–semiconductor field-effect transistors) integrate into a small chip. This results in circuits that are orders of magnitude smaller, faster, and less expensive than those constructed of discrete electronic components. The IC's mass production capability, reliability, and building-block approach to integrated circuit design has ensured the rapid adoption of standardized ICs in place of designs using discrete transistors. ICs are now used in virtually all electronic equipment and have revolutionized the world of electronics. Computers, mobile phones and other home appliances are now inextricable parts of the structure of modern societies, made possible by the small size and low cost of ICs such as modern computer ...
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Microlithography
Microlithography is a general name for any manufacturing process that can create a minutely patterned thin film of protective materials over a substrate, such as a silicon wafer, in order to protect selected areas of it during subsequent etching, deposition, or implantation operations. The term is normally used for processes that can reliably produce features of microscopic size, such as 10 micrometres or less. The term nanolithography may be used to designate processes that can produce nanoscale features, such as less than 100 nanometres. Microlithography is a microfabrication process that is extensively used in the semiconductor industry and also manufacture microelectromechanical systems. Processes Specific microlithography processes include: * Photolithography using light projected on a photosensitive metarial film (photoresist). * Electron beam lithography, using a steerable electron beam. * Nanoimprinting * Interference lithography * Magnetolithography * Scanning prob ...
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Semiconductor Fabrication
Semiconductor device fabrication is the process used to manufacture semiconductor devices, typically integrated circuit (IC) chips such as modern computer processors, microcontrollers, and memory chips such as NAND flash and DRAM that are present in everyday electrical and electronic devices. It is a multiple-step sequence of photolithographic and chemical processing steps (such as surface passivation, thermal oxidation, planar diffusion and junction isolation) during which electronic circuits are gradually created on a wafer made of pure semiconducting material. Silicon is almost always used, but various compound semiconductors are used for specialized applications. The entire manufacturing process takes time, from start to packaged chips ready for shipment, at least six to eight weeks (tape-out only, not including the circuit design) and is performed in highly specialized semiconductor fabrication plants, also called foundries or fabs. All fabrication takes place inside a c ...
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Lithography
Lithography () is a planographic method of printing originally based on the immiscibility of oil and water. The printing is from a stone (lithographic limestone) or a metal plate with a smooth surface. It was invented in 1796 by the German author and actor Alois Senefelder and was initially used mostly for musical scores and maps.Meggs, Philip B. A History of Graphic Design. (1998) John Wiley & Sons, Inc. p 146 Carter, Rob, Ben Day, Philip Meggs. Typographic Design: Form and Communication, Third Edition. (2002) John Wiley & Sons, Inc. p 11 Lithography can be used to print text or images onto paper or other suitable material. A lithograph is something printed by lithography, but this term is only used for fine art prints and some other, mostly older, types of printed matter, not for those made by modern commercial lithography. Originally, the image to be printed was drawn with a greasy substance, such as oil, fat, or wax onto the surface of a smooth and flat limestone plat ...
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Printed Circuit Board
A printed circuit board (PCB; also printed wiring board or PWB) is a medium used in Electrical engineering, electrical and electronic engineering to connect electronic components to one another in a controlled manner. It takes the form of a Lamination, laminated sandwich structure of conductive and insulating layers: each of the conductive layers is designed with an artwork pattern of traces, planes and other features (similar to wires on a flat surface) Chemical milling, etched from one or more sheet layers of copper Lamination, laminated onto and/or between sheet layers of a Insulator (electricity), non-conductive substrate. Electrical components may be fixed to conductive pads on the outer layers in the shape designed to accept the component's terminals, generally by means of soldering, to both electrically connect and mechanically fasten them to it. Another manufacturing process adds Via (electronics), vias: plated-through holes that allow interconnections between layers. ...
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Contact Printing
A contact print is a photographic image produced from film; sometimes from a film negative, and sometimes from a film positive or paper negative. In a darkroom an exposed and developed piece of film or photographic paper is placed emulsion side down, in contact with a piece of photographic paper, light is briefly shone through the negative or paper and then the paper is developed to reveal the final print. The defining characteristic of a contact print is that the resulting print is the same size as the original, rather than having been projected through an enlarger. Basic tools Contact printing is a simple and inexpensive process. Its simplicity avails itself to those who may want to try darkroom processing without buying an enlarger. One or more negatives are placed on a sheet of photographic paper which is briefly exposed to a light source. The light may come from a low wattage frosted bulb hanging above an easel which holds them together, or contained in an exposure ...
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Lens
A lens is a transmissive optical device which focuses or disperses a light beam by means of refraction. A simple lens consists of a single piece of transparent material, while a compound lens consists of several simple lenses (''elements''), usually arranged along a common axis. Lenses are made from materials such as glass or plastic, and are ground and polished or molded to a desired shape. A lens can focus light to form an image, unlike a prism, which refracts light without focusing. Devices that similarly focus or disperse waves and radiation other than visible light are also called lenses, such as microwave lenses, electron lenses, acoustic lenses, or explosive lenses. Lenses are used in various imaging devices like telescopes, binoculars and cameras. They are also used as visual aids in glasses to correct defects of vision such as myopia and hypermetropia. History The word ''lens'' comes from '' lēns'', the Latin name of the lentil (a seed of a lentil plant), b ...
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Projection (physics)
The vector projection of a vector on (or onto) a nonzero vector , sometimes denoted \operatorname_\mathbf \mathbf (also known as the vector component or vector resolution of in the direction of ), is the orthogonal projection of onto a straight line parallel to . It is a vector parallel to , defined as: \mathbf_1 = a_1\mathbf where a_1 is a scalar, called the scalar projection of onto , and is the unit vector in the direction of . In turn, the scalar projection is defined as: a_1 = \left\, \mathbf\right\, \cos\theta = \mathbf\cdot\mathbf where the operator ⋅ denotes a dot product, ‖a‖ is the length of , and ''θ'' is the angle between and . Which finally gives: \mathbf_1 = \left(\mathbf \cdot \mathbf\right) \mathbf = \frac \frac = \frac = \frac ~ . The scalar projection is equal to the length of the vector projection, with a minus sign if the direction of the projection is opposite to the direction of . The vector component or vector resolute of perpendi ...
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Photography
Photography is the art, application, and practice of creating durable images by recording light, either electronically by means of an image sensor, or chemically by means of a light-sensitive material such as photographic film. It is employed in many fields of science, manufacturing (e.g., photolithography), and business, as well as its more direct uses for art, film and video production, recreational purposes, hobby, and mass communication. Typically, a lens is used to focus the light reflected or emitted from objects into a real image on the light-sensitive surface inside a camera during a timed exposure. With an electronic image sensor, this produces an electrical charge at each pixel, which is electronically processed and stored in a digital image file for subsequent display or processing. The result with photographic emulsion is an invisible latent image, which is later chemically "developed" into a visible image, either negative or positive, depending on the purp ...
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Directed Assembly Of Micro- And Nano-structures
Directed assembly of micro- and nano-structures are methods of mass-producing micro to nano devices and materials. Directed assembly allows the accurate control of assembly of micro and nano particles to form even the most intricate and highly functional devices or materials. Directed self-assembly Directed self-assembly (DSA) is a type of directed assembly which utilizes block co-polymer morphology to create lines, space and hole patterns, facilitating for a more accurate control of the feature shapes. Then it uses surface interactions as well as polymer thermodynamics to finalize the formation of the final pattern shapes. To control the surface interactions enabling sub-10 nm resolution, a team consisting of Massachusetts Institute of Technology, University of Chicago, and Argonne National Laboratory developed a way to use vapor-phase deposited polymeric top layer on the block co-polymer film in 2017. The DSA is not a standalone process, but rather is integrated with tradi ...
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Scanning Probe Lithography
Scanning probe lithography (SPL) describes a set of nanolithographic methods to pattern material on the nanoscale using scanning probes. It is a direct-write, mask-less approach which bypasses the diffraction limit and can reach resolutions below 10 nm. It is considered an alternative lithographic technology often used in academic and research environments. The term ''scanning probe lithography'' was coined after the first patterning experiments with scanning probe microscopes (SPM) in the late 1980s. Classification The different approaches towards SPL can be classified by their goal to either add or remove material, by the general nature of the process either chemical or physical, or according to the driving mechanisms of the probe-surface interaction used in the patterning process: mechanical, thermal, diffusive and electrical. Overview Mechanical/thermo-mechanical Mechanical scanning probe lithography (m-SPL) is a nanomachining or ''nano-scratching'' top-down app ...
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Magnetolithography
Magnetolithography (ML) is a photoresist-less and photomaskless lithography method for patterning wafer surfaces. ML based on applying a magnetic field on the substrate using paramagnetic metal masks named "magnetic mask" placed on either topside or backside of the wafer. Magnetic masks are analogous to a photomask in photolithography, in that they define the spatial distribution and shape of the applied magnetic field. The fabrication of the magnetic masks involves the use of conventional photolithography and photoresist however. The second component of the process is ferromagnetic nanoparticles (analogous to the photoresist in photolithography, e.g. cobalt nanoparticles) that are assembled over the substrate according to the field induced by the mask which blocks its areas from reach of etchants or depositing materials (e.g. dopants or metallic layers). ML can be used for applying either a positive or negative approach. In the positive approach, the magnetic nanoparticles react c ...
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