Magnetolithography (ML) is a

photoresist A photoresist (also known simply as a resist) is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronic industry. T ...

-less and photomaskless lithography method for patterning

wafer A wafer is a crisp, often sweet, very thin, flat, light and dry biscuit, often used to decorate ice cream, and also used as a garnish on some sweet dishes. Wafers can also be made into cookies with cream flavoring sandwiched between them. They ...

surfaces. ML based on applying a

magnetic field A magnetic field is a vector field that describes the magnetic influence on moving electric charges, electric currents, and magnetic materials. A moving charge in a magnetic field experiences a force perpendicular to its own velocity and to ...

on the substrate using paramagnetic metal masks named "magnetic mask" placed on either topside or backside of the wafer. Magnetic masks are analogous to a

photomask A photomask is an opaque plate with holes or transparencies that allow light to shine through in a defined pattern. They are commonly used in photolithography and the production of integrated circuits (ICs or "chips") in particular. Masks are used ...

in photolithography, in that they define the spatial distribution and shape of the applied magnetic field. The fabrication of the magnetic masks involves the use of conventional photolithography and photoresist however. The second component of the process is

ferromagnetic Ferromagnetism is a property of certain materials (such as iron) which results in a large observed magnetic permeability, and in many cases a large magnetic coercivity allowing the material to form a permanent magnet. Ferromagnetic materials ...

nanoparticles (analogous to the

in photolithography, e.g.

cobalt Cobalt is a chemical element with the symbol Co and atomic number 27. As with nickel, cobalt is found in the Earth's crust only in a chemically combined form, save for small deposits found in alloys of natural meteoric iron. The free element, pr ...

nanoparticles) that are assembled over the substrate according to the field induced by the mask which blocks its areas from reach of etchants or depositing materials (e.g.

dopant A dopant, also called a doping agent, is a trace of impurity element that is introduced into a chemical material to alter its original electrical or optical properties. The amount of dopant necessary to cause changes is typically very low. When ...

s or metallic layers). ML can be used for applying either a positive or negative approach. In the positive approach, the magnetic nanoparticles react chemically or interact via chemical recognition with the substrate. Hence, the magnetic nanoparticles are immobilized at selected locations, where the mask induces a magnetic field, resulting in a patterned substrate. In the negative approach, the magnetic nanoparticles are inert to the substrate. Hence, once they pattern the substrate, they block their binding site on the substrate from reacting with another reacting agent. After the adsorption of the reacting agent, the nanoparticles are removed, resulting in a negatively patterned substrate. ML is also a backside

lithography Lithography () is a planographic method of printing originally based on the immiscibility of oil and water. The printing is from a stone (lithographic limestone) or a metal plate with a smooth surface. It was invented in 1796 by the German a ...

, which has the advantage of ease in producing multilayer with high accuracy of alignment and with the same efficiency for all layers.

References

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