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Tungsten Silicide
Tungsten silicide (WSi2) is an inorganic compound, a silicide of tungsten. It is an electrically conductive ceramic material. Chemistry Tungsten silicide can react violently with substances such as strong acids, fluorine Fluorine is a chemical element with the symbol F and atomic number 9. It is the lightest halogen and exists at standard conditions as a highly toxic, pale yellow diatomic gas. As the most electronegative reactive element, it is extremely reacti ..., oxidizers, and interhalogens. Applications It is used in microelectronics as a contact material, with resistivity 60–80 μΩ cm; it forms at 1000 °C. It is often used as a shunt (electrical), shunt over polysilicon lines to increase their conductivity and increase signal speed. Tungsten silicide layers can be prepared by chemical vapor deposition, e.g. using monosilane or dichlorosilane with tungsten hexafluoride as source gases. The deposited film is non-stoichiometric, and requires Annealing ...
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Tetragonal
In crystallography, the tetragonal crystal system is one of the 7 crystal systems. Tetragonal crystal lattices result from stretching a cubic lattice along one of its lattice vectors, so that the cube becomes a rectangular prism with a square base (''a'' by ''a'') and height (''c'', which is different from ''a''). Bravais lattices There are two tetragonal Bravais lattices: the primitive tetragonal and the body-centered tetragonal. The base-centered tetragonal lattice is equivalent to the primitive tetragonal lattice with a smaller unit cell, while the face-centered tetragonal lattice is equivalent to the body-centered tetragonal lattice with a smaller unit cell. Crystal classes The point groups that fall under this crystal system are listed below, followed by their representations in international notation, Schoenflies notation, orbifold notation, Coxeter notation and mineral examples.Hurlbut, Cornelius S.; Klein, Cornelis, 1985, ''Manual of Mineralogy'', 20th ed., p ...
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Dichlorosilane
Dichlorosilane, or DCS as it is commonly known, is a chemical compound with the formula H2SiCl2. In its major use, it is mixed with ammonia (NH3) in LPCVD chambers to grow silicon nitride in semiconductor processing. A higher concentration of DCS·NH3 (i.e. 16:1), usually results in lower stress nitride films. History Dichlorosilane was originally prepared in 1919 by the gas-phase reaction of monosilane, SiH4, with hydrogen chloride, HCl, and then reported by Stock and Somieski. It was found that in the gas phase, dichlorosilane will react with water vapor to give a gaseous monomeric prosiloxane, H2SiO. Prosiloxane polymerizes rapidly in the liquid phase and slowly in the gas phase, which results in liquid and solid polysiloxanes 2SiOsub>n. The liquid portion of the product, which is collected via vacuum distillation, becomes viscous and gelled at room temperature. Hydrolysis was done on a solution of H2SiCl2 in benzene by brief contact with water, and the molecular weight was ...
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Group 6 Silicides
A group is a number of persons or things that are located, gathered, or classed together. Groups of people * Cultural group, a group whose members share the same cultural identity * Ethnic group, a group whose members share the same ethnic identity * Religious group (other), a group whose members share the same religious identity * Social group, a group whose members share the same social identity * Tribal group, a group whose members share the same tribal identity * Organization, an entity that has a collective goal and is linked to an external environment * Peer group, an entity of three or more people with similar age, ability, experience, and interest Social science * In-group and out-group * Primary, secondary, and reference groups * Social group * Collectives Science and technology Mathematics * Group (mathematics), a set together with a binary operation satisfying certain algebraic conditions Chemistry * Functional group, a group of atoms which provide s ...
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Ceramic Materials
A ceramic is any of the various hard, brittle, heat-resistant and corrosion-resistant materials made by shaping and then firing an inorganic, nonmetallic material, such as clay, at a high temperature. Common examples are earthenware, porcelain, and brick. The earliest ceramics made by humans were pottery objects (''pots,'' ''vessels or vases'') or figurines made from clay, either by itself or mixed with other materials like silica, hardened and sintered in fire. Later, ceramics were glazed and fired to create smooth, colored surfaces, decreasing porosity through the use of glassy, amorphous ceramic coatings on top of the crystalline ceramic substrates. Ceramics now include domestic, industrial and building products, as well as a wide range of materials developed for use in advanced ceramic engineering, such as in semiconductors. The word "''ceramic''" comes from the Greek word (), "of pottery" or "for pottery", from (), "potter's clay, tile, pottery". The earliest known m ...
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Heat Shield
In thermodynamics, heat is defined as the form of energy crossing the boundary of a thermodynamic system by virtue of a temperature difference across the boundary. A thermodynamic system does not ''contain'' heat. Nevertheless, the term is also often used to refer to the thermal energy contained in a system as a component of its internal energy and that is reflected in the temperature of the system. For both uses of the term, heat is a form of energy. An example of formal vs. informal usage may be obtained from the right-hand photo, in which the metal bar is "conducting heat" from its hot end to its cold end, but if the metal bar is considered a thermodynamic system, then the energy flowing within the metal bar is called internal energy, not heat. The hot metal bar is also transferring heat to its surroundings, a correct statement for both the strict and loose meanings of ''heat''. Another example of informal usage is the term '' heat content'', used despite the fact that p ...
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Radiative Cooling
In the study of heat transfer, radiative cooling is the process by which a body loses heat by thermal radiation. As Planck's law describes, every physical body spontaneously and continuously emits electromagnetic radiation. Radiative cooling has been applied in various contexts throughout human history, including ice making in India and Iran, heat shields for spacecrafts, and in architecture. In 2014, a scientific breakthrough in the use of photonic metamaterials made daytime radiative cooling possible. It has since been proposed as a strategy to mitigate local and global warming caused by greenhouse gas emissions known as passive daytime radiative cooling. Terrestrial radiative cooling Mechanism Infrared radiation can pass through dry, clear air in the wavelength range of 8–13 µm. Materials that can absorb energy and radiate it in those wavelengths exhibit a strong cooling effect. Materials that can also reflect 95% or more of sunlight in the 200 nanometres to 2. ...
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Emissivity
The emissivity of the surface of a material is its effectiveness in emitting energy as thermal radiation. Thermal radiation is electromagnetic radiation that most commonly includes both visible radiation (light) and infrared radiation, which is not visible to human eyes. A portion of the thermal radiation from very hot objects (see photograph) is easily visible to the eye. The emissivity of a surface depends on its chemical composition and geometrical structure. Quantitatively, it is the ratio of the thermal radiation from a surface to the radiation from an ideal black surface at the same temperature as given by the Stefan–Boltzmann law. The ratio varies from 0 to 1. The surface of a perfect black body (with an emissivity of 1) emits thermal radiation at the rate of approximately 448 watts per square metre at room temperature (, ). All real objects have emissivities less than 1.0, and emit radiation at correspondingly lower rates. Emissivities are important in several conte ...
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Oxidation
Redox (reduction–oxidation, , ) is a type of chemical reaction in which the oxidation states of substrate change. Oxidation is the loss of electrons or an increase in the oxidation state, while reduction is the gain of electrons or a decrease in the oxidation state. There are two classes of redox reactions: * ''Electron-transfer'' – Only one (usually) electron flows from the reducing agent to the oxidant. This type of redox reaction is often discussed in terms of redox couples and electrode potentials. * ''Atom transfer'' – An atom transfers from one substrate to another. For example, in the rusting of iron, the oxidation state of iron atoms increases as the iron converts to an oxide, and simultaneously the oxidation state of oxygen decreases as it accepts electrons released by the iron. Although oxidation reactions are commonly associated with the formation of oxides, other chemical species can serve the same function. In hydrogenation, C=C (and other) bonds ar ...
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Nitrogen Trifluoride
Nitrogen trifluoride () is an inorganic, colorless, non-flammable, toxic gas with a slightly musty odor. It finds increasing use within the manufacturing of flat-panel displays, photovoltaics, LEDs and other microelectronics. Nitrogen trifluoride is also an extremely strong and long-lived greenhouse gas. Its atmospheric burden exceeded 2 parts per trillion during 2019 and has doubled every five years since the late 20th century. Synthesis and reactivity Nitrogen trifluoride did not exist in significant quantities on Earth prior to its synthesis by humans. It is a rare example of a binary fluoride that can be prepared directly from the elements only at very uncommon conditions, such as an electric discharge. After first attempting the synthesis in 1903, Otto Ruff prepared nitrogen trifluoride by the electrolysis of a molten mixture of ammonium fluoride and hydrogen fluoride. It proved to be far less reactive than the other nitrogen trihalides nitrogen trichloride, nitrogen trib ...
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Plasma Etching
Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radicals). During the process, the plasma generates volatile etch products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma. Eventually the atoms of the shot element embed themselves at or just below the surface of the target, thus modifying the physical properties of the target. Mechanisms Plasma generation A plasma is a high energetic condition in which a lot of processes can occur. These processes happen because of electrons and atoms. To form the plasma electrons have to be accelerated to gain energy. Highly energetic electrons transfer the energy to atoms by collisions. Three different pr ...
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Microelectromechanical Systems
Microelectromechanical systems (MEMS), also written as micro-electro-mechanical systems (or microelectronic and microelectromechanical systems) and the related micromechatronics and microsystems constitute the technology of microscopic devices, particularly those with moving parts. They merge at the nanoscale into nanoelectromechanical systems (NEMS) and nanotechnology. MEMS are also referred to as micromachines in Japan and microsystem technology (MST) in Europe. MEMS are made up of components between 1 and 100 micrometers in size (i.e., 0.001 to 0.1 mm), and MEMS devices generally range in size from 20 micrometres to a millimetre (i.e., 0.02 to 1.0 mm), although components arranged in arrays (e.g., digital micromirror devices) can be more than 1000 mm2. They usually consist of a central unit that processes data (an integrated circuit chip such as microprocessor) and several components that interact with the surroundings (such as microsensors). Because of the la ...
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Barrier Layer
A diffusion barrier is a thin layer (usually micrometres thick) of metal usually placed between two other metals. It is done to act as a barrier to protect either one of the metals from corrupting the other.. Adhesion of a electroplating, plated metal layer to its substrate requires a physical interlocking, inter-diffusion of the deposit or a chemical bonding between plate and substrate in order to work. The role of a diffusion barrier is to prevent or to retard the inter-diffusion of the two superposed metals. Therefore, to be effective, a good diffusion barrier requires inertness with respect to adjacent materials. To obtain good adhesion and a diffusion barrier simultaneously, the bonding between layers needs to come from a chemical reaction of limited range at both boundaries. Materials providing good adhesion are not necessarily good diffusion barriers and vice versa. Consequently, there are cases where two or more separate layers must be used to provide a proper interface betw ...
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