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Ion Beam Lithography
Ion-beam lithography is the practice of scanning a focused beam of ions in a patterned fashion across a surface in order to create very small structures such as integrated circuits or other nanostructures. Details Ion-beam lithography has been found to be useful for transferring high-fidelity patterns on three-dimensional surfaces. Ion-beam lithography offers higher resolution patterning than UV, X-ray, or electron beam lithography because these heavier particles have more momentum. This gives the ion beam a smaller wavelength than even an e-beam and therefore almost no diffraction. The momentum also reduces scattering in the target and in any residual gas. There is also a reduced potential radiation effect to sensitive underlying structures compared to x-ray and e-beam lithography. Ion-beam lithography, or ion-projection lithography, is similar to Electron beam lithography, but uses much heavier charged particles, ions. In addition to diffraction being negligible, ions move ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Focused Ion Beam
Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor industry, materials science and increasingly in the biological field for site-specific analysis, deposition, and ablation of materials. A FIB setup is a scientific instrument that resembles a scanning electron microscope (SEM). However, while the SEM uses a focused beam of electrons to image the sample in the chamber, a FIB setup uses a focused beam of ions instead. FIB can also be incorporated in a system with both electron and ion beam columns, allowing the same feature to be investigated using either of the beams. FIB should not be confused with using a beam of focused ions for direct write lithography (such as in proton beam writing). These are generally quite different systems where the material is modified by other mechanisms. Ion beam source Most widespread instruments are using liquid metal ion sources (LMIS), especially gallium ion sources. Ion sources based on elemental gold an ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Integrated Circuit
An integrated circuit or monolithic integrated circuit (also referred to as an IC, a chip, or a microchip) is a set of electronic circuits on one small flat piece (or "chip") of semiconductor material, usually silicon. Large numbers of tiny MOSFETs (metal–oxide–semiconductor field-effect transistors) integrate into a small chip. This results in circuits that are orders of magnitude smaller, faster, and less expensive than those constructed of discrete electronic components. The IC's mass production capability, reliability, and building-block approach to integrated circuit design has ensured the rapid adoption of standardized ICs in place of designs using discrete transistors. ICs are now used in virtually all electronic equipment and have revolutionized the world of electronics. Computers, mobile phones and other home appliances are now inextricable parts of the structure of modern societies, made possible by the small size and low cost of ICs such as modern computer ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Nanostructure
A nanostructure is a structure of intermediate size between microscopic and molecular structures. Nanostructural detail is microstructure at nanoscale. In describing nanostructures, it is necessary to differentiate between the number of dimensions in the volume of an object which are on the nanoscale. Nanotextured surfaces have ''one dimension'' on the nanoscale, i.e., only the thickness of the surface of an object is between 0.1 and 100 nm. Nanotubes have ''two dimensions'' on the nanoscale, i.e., the diameter of the tube is between 0.1 and 100 nm; its length can be far more. Finally, spherical nanoparticles have ''three dimensions'' on the nanoscale, i.e., the particle is between 0.1 and 100 nm in each spatial dimension. The terms nanoparticles and ultrafine particles (UFP) are often used synonymously although UFP can reach into the micrometre range. The term ''nanostructure'' is often used when referring to magnetic technology. Nanoscale structure in biology i ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
The Guardian
''The Guardian'' is a British daily newspaper. It was founded in 1821 as ''The Manchester Guardian'', and changed its name in 1959. Along with its sister papers ''The Observer'' and ''The Guardian Weekly'', ''The Guardian'' is part of the Guardian Media Group, owned by the Scott Trust. The trust was created in 1936 to "secure the financial and editorial independence of ''The Guardian'' in perpetuity and to safeguard the journalistic freedom and liberal values of ''The Guardian'' free from commercial or political interference". The trust was converted into a limited company in 2008, with a constitution written so as to maintain for ''The Guardian'' the same protections as were built into the structure of the Scott Trust by its creators. Profits are reinvested in journalism rather than distributed to owners or shareholders. It is considered a newspaper of record in the UK. The editor-in-chief Katharine Viner succeeded Alan Rusbridger in 2015. Since 2018, the paper's main news ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Matter Wave
Matter waves are a central part of the theory of quantum mechanics, being an example of wave–particle duality. All matter exhibits wave-like behavior. For example, a beam of electrons can be diffracted just like a beam of light or a water wave. In most cases, however, the wavelength is too small to have a practical impact on day-to-day activities. The concept that matter behaves like a wave was proposed by French physicist Louis de Broglie () in 1924. It is also referred to as the ''de Broglie hypothesis''. Matter waves are referred to as ''de Broglie waves''. The ''de Broglie wavelength'' is the wavelength, , associated with a massive particle (i.e., a particle with mass, as opposed to a massless particle) and is related to its momentum, , through the Planck constant, : : \lambda = \frac=\frac. Wave-like behavior of matter was first experimentally demonstrated by George Paget Thomson's thin metal diffraction experiment, and independently in the Davisson–Germer experiment, ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Electron Beam Lithography
Electron-beam lithography (often abbreviated as e-beam lithography, EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). The electron beam changes the solubility of the resist, enabling selective removal of either the exposed or non-exposed regions of the resist by immersing it in a solvent (developing). The purpose, as with photolithography, is to create very small structures in the resist that can subsequently be transferred to the substrate material, often by etching. The primary advantage of electron-beam lithography is that it can draw custom patterns (direct-write) with sub-10 nm resolution. This form of maskless lithography has high resolution and low throughput, limiting its usage to photomask fabrication, low-volume production of semiconductor devices, and research and development. Systems Electron-beam lithography systems used in commercial applications ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Shot Noise
Shot noise or Poisson noise is a type of noise which can be modeled by a Poisson process. In electronics shot noise originates from the discrete nature of electric charge. Shot noise also occurs in photon counting in optical devices, where shot noise is associated with the particle nature of light. Origin In a statistical experiment such as tossing a fair coin and counting the occurrences of heads and tails, the numbers of heads and tails after many throws will differ by only a tiny percentage, while after only a few throws outcomes with a significant excess of heads over tails or vice versa are common; if an experiment with a few throws is repeated over and over, the outcomes will fluctuate a lot. From the law of large numbers, one can show that the relative fluctuations reduce as the reciprocal square root of the number of throws, a result valid for all statistical fluctuations, including shot noise. Shot noise exists because phenomena such as light and electric current co ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Bragg Curve
The Bragg peak is a pronounced peak on the Bragg curve which plots the energy loss of ionizing radiation during its travel through matter. For protons, α-rays, and other ion rays, the peak occurs immediately before the particles come to rest. It is named after William Henry Bragg, who discovered it in 1903. When a fast charged particle moves through matter, it ionizes atoms of the material and deposits a dose along its path. A peak occurs because the interaction cross section increases as the charged particle's energy decreases. Energy lost by charged particles is inversely proportional to the square of their velocity, which explains the peak occurring just before the particle comes to a complete stop. In the upper figure, it is the peak for alpha particles of 5.49 MeV moving through air. In the lower figure, it is the narrow peak of the "native" proton beam curve which is produced by a particle accelerator of 250 MeV. The figure also shows the absorption of a beam of energe ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Collider
A collider is a type of particle accelerator which brings two opposing particle beams together such that the particles collide. Colliders may either be ring accelerators or linear accelerators. Colliders are used as a research tool in particle physics by accelerating particles to very high kinetic energy and letting them impact other particles. Analysis of the byproducts of these collisions gives scientists good evidence of the structure of the subatomic world and the laws of nature governing it. These may become apparent only at high energies and for tiny periods of time, and therefore may be hard or impossible to study in other ways. Explanation In particle physics one gains knowledge about elementary particles by accelerating particles to very high kinetic energy and letting them impact on other particles. For sufficiently high energy, a reaction occurs that transforms the particles into other particles. Detecting these products gives insight into the physics involved. To do ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Particle Accelerator
A particle accelerator is a machine that uses electromagnetic fields to propel charged particles to very high speeds and energies, and to contain them in well-defined beams. Large accelerators are used for fundamental research in particle physics. The largest accelerator currently active is the Large Hadron Collider (LHC) near Geneva, Switzerland, operated by the CERN. It is a collider accelerator, which can accelerate two beams of protons to an energy of 6.5 TeV and cause them to collide head-on, creating center-of-mass energies of 13 TeV. Other powerful accelerators are, RHIC at Brookhaven National Laboratory in New York and, formerly, the Tevatron at Fermilab, Batavia, Illinois. Accelerators are also used as synchrotron light sources for the study of condensed matter physics. Smaller particle accelerators are used in a wide variety of applications, including particle therapy for oncological purposes, radioisotope production for medical diagnostics, ion ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
E-beam Lithography
Electron-beam lithography (often abbreviated as e-beam lithography, EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). The electron beam changes the solubility of the resist, enabling selective removal of either the exposed or non-exposed regions of the resist by immersing it in a solvent (developing). The purpose, as with photolithography, is to create very small structures in the resist that can subsequently be transferred to the substrate material, often by etching. The primary advantage of electron-beam lithography is that it can draw custom patterns (direct-write) with sub-10 nm resolution. This form of maskless lithography has high resolution and low throughput, limiting its usage to photomask fabrication, low-volume production of semiconductor devices, and research and development. Systems Electron-beam lithography systems used in commercial applications ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Maskless Lithography
Maskless lithography (MPL) is a photomask-less photolithography-like technology used to project or focal-spot write the image pattern onto a chemical resist-coated substrate (e.g. wafer) by means of UV radiation or electron beam. In microlithography, typically UV radiation casts an image of a time constant mask onto a photosensitive emulsion (or photoresist). Traditionally, mask aligners, steppers, scanners, and other kinds of non-optical techniques are used for high speed microfabrication of microstructures, but in case of MPL, some of these become redundant. Maskless lithography has two approaches to project a pattern: rasterized and vectorized. In the first one it utilizes generation of a time-variant intermittent image on an electronically modifiable (virtual) mask that is projected with known means (also known as Laser Direct Imaging and other synonyms). In the vectored approach, direct writing is achieved by radiation that is focused to a narrow beam that is scanned in vect ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
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