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Ghavam Shahidi
Ghavam G. Shahidi (born 1959) is an Iranian-American electrical engineer and IBM Fellow. He is the director of Silicon Technology at the IBM Thomas J Watson Research Center. He is best known for his pioneering work in silicon-on-insulator (SOI) complementary metal–oxide–semiconductor (CMOS) technology since the late 1980s. Career He studied electrical engineering at MIT, where he wrote a PhD thesis on "velocity overshoot in deeply scaled MOSFETs" (metal–oxide–semiconductor field-effect transistors), under supervision of Professor Dimitri A. Antoniadis. A 60nanometer silicon MOSFET (metal–oxide–semiconductor field-effect transistor) was fabricated by Shahidi with Antoniadis and Henry I. Smith at MIT in 1986. The device was fabricated using X-ray lithography. Shahidi joined IBM Research in 1989, where he initiated and subsequently led the development of silicon-on-insulator (SOI) complementary metal–oxide–semiconductor (CMOS) technology at IBM. It was called the ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Iranian-American
Iranian-Americans, also known as Persian-Americans, are United States citizens or nationals who are of Iranian ancestry, or who hold Iranian citizenship. Most Iranian-Americans arrived in the United States after 1979, as a result of the Iranian Revolution and the fall of the Iranian monarchy, with over 40% settling in California, specifically Los Angeles. They have created many distinct ethnic enclaves, such as the Angelino community of " Tehrangeles", in Westwood, Los Angeles. Based on a 2012 announcement by the National Organization for Civil Registration, an organization of the Ministry of Interior of Iran, the United States has the greatest number of Iranians outside the country. Research by the Iranian Studies Group at the Massachusetts Institute of Technology in 2004 estimated the number of Iranian-Americans at 691,000, about half of whom live in the state of California. Terminology "Iranian-American" is sometimes used interchangeably with "Persian-American", partl ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
MOSFET Scaling
file:D2PAK.JPG, upright=1.3, Two power transistor, power MOSFETs in D2PAK surface-mount packages. Operating as switches, each of these components can sustain a blocking voltage of 120volts, V in the ''off'' state, and can conduct a continuous current of 30 amperes, A in the ''on'' state, dissipating up to about 100 watt, W and controlling a load of over 2000 W. A matchstick is pictured for scale. In electronics, the metal–oxide–semiconductor field-effect transistor (MOSFET, MOS-FET, MOS FET, or MOS transistor) is a type of field-effect transistor (FET), most commonly fabricated by the thermal oxidation, controlled oxidation of silicon. It has an insulated gate, the voltage of which determines the conductivity of the device. This ability to change conductivity with the amount of applied voltage can be used for amplifying or switching electronic signals. The term ''metal–insulator–semiconductor field-effect transistor'' (''MISFET'') is almost synonymo ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Semiconductor
A semiconductor is a material with electrical conductivity between that of a conductor and an insulator. Its conductivity can be modified by adding impurities (" doping") to its crystal structure. When two regions with different doping levels are present in the same crystal, they form a semiconductor junction. The behavior of charge carriers, which include electrons, ions, and electron holes, at these junctions is the basis of diodes, transistors, and most modern electronics. Some examples of semiconductors are silicon, germanium, gallium arsenide, and elements near the so-called " metalloid staircase" on the periodic table. After silicon, gallium arsenide is the second-most common semiconductor and is used in laser diodes, solar cells, microwave-frequency integrated circuits, and others. Silicon is a critical element for fabricating most electronic circuits. Semiconductor devices can display a range of different useful properties, such as passing current more easil ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Immersion Lithography
Immersion lithography is a technique used in semiconductor manufacturing to enhance the resolution and accuracy of the lithographic process. It involves using a liquid medium, typically water, between the lens and the wafer during exposure. By using a liquid with a higher refractive index than air, immersion lithography allows for smaller features to be created on the wafer. Immersion lithography replaces the usual air gap between the final lens and the wafer surface with a liquid medium that has a refractive index greater than one. The angular resolution is increased by a factor equal to the refractive index of the liquid. Current immersion lithography tools use highly purified water for this liquid, achieving feature sizes below 45 nanometers. Background The ability to resolve features in optical lithography is directly related to the numerical aperture of the imaging equipment, the numerical aperture being the sine of the maximum refraction angle multiplied by the refracti ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Lithography
Lithography () is a planographic method of printing originally based on the miscibility, immiscibility of oil and water. The printing is from a stone (lithographic limestone) or a metal plate with a smooth surface. It was invented in 1796 by the German author and actor Alois Senefelder and was initially used mostly for sheet music, musical scores and maps.Meggs, Philip B. ''A History of Graphic Design''. (1998) John Wiley & Sons, Inc. p 146, .Carter, Rob, Ben Day, Philip Meggs. ''Typographic Design: Form and Communication'', Third Edition. (2002) John Wiley & Sons, Inc. p. 11. Lithography can be used to print text or images onto paper or other suitable material. A lithograph is something printed by lithography, but this term is only used for printmaking, fine art prints and some other, mostly older, types of printed matter, not for those made by modern commercial lithography. Traditionally, the image to be printed was drawn with a greasy substance, such as oil, fat, or wax on ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Business Week
''Bloomberg Businessweek'', previously known as ''BusinessWeek'' (and before that ''Business Week'' and ''The Business Week''), is an American monthly business magazine published 12 times a year. The magazine debuted in New York City in September 1929. Since 2009, the magazine has been owned by Bloomberg L.P. and became a monthly in June 2024. History 1929–2008: ''Businessweek'' ''The Business Week'' was first published based in New York City in September 1929, weeks before the stock market crash. The magazine provided information and opinions on what was happening in the business world at the time. Early sections of the magazine included marketing, labor, finance, management and Washington Outlook, which made it one of the first publications to cover national political issues that directly impacted the business world. The name of the magazine was shortened to ''Business Week'' in 1934. Originally published as a resource for business managers, the magazine shifted its s ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Low-κ Dielectric
In semiconductor manufacturing, a low-κ is a material with a small relative dielectric constant (κ, kappa) relative to silicon dioxide. Low-κ dielectric material implementation is one of several strategies used to allow continued scaling of microelectronic devices, colloquially referred to as extending Moore's law. In digital circuits, insulating dielectrics separate the conducting parts (wire interconnects and transistors) from one another. As components have scaled and transistors have gotten closer together, the insulating dielectrics have thinned to the point where charge build up and crosstalk adversely affect the performance of the device. Replacing the silicon dioxide with a low-κ dielectric of the same thickness reduces parasitic capacitance, enabling faster switching speeds (in case of synchronous circuits) and lower heat dissipation. In conversation such materials may be referred to as "low-k" (spoken "low-kay") rather than "low-κ" (low-kappa). Low-κ materials ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
130 Nanometer
The 130 nanometer (130 nm) process is a level of semiconductor process technology that was reached in the 2000–2001 timeframe by such leading semiconductor companies as Intel, Texas Instruments, IBM, and TSMC. The origin of the 130 nm value is historical, as it reflects a trend of 70% scaling every 2–3 years. The naming is formally determined by the International Technology Roadmap for Semiconductors (ITRS). Some of the first CPUs manufactured with this process include Intel Tualatin family of Pentium III processors. Processors using 130 nm manufacturing technology * Motorola PowerPC 7447 and 7457 2002 * IBM Gekko (GameCube) * IBM PowerPC G5 970 - October 2002 - June 2003 * Intel Pentium III Tualatin - 2001-06 * Intel Celeron Tualatin-256 - 2001-10-02 * Intel Pentium M Banias - 2003-03-12 * Intel Pentium 4 Northwood - 2002-01-07 * Intel Celeron Northwood-128 - 2002-09-18 * Intel Xeon Prestonia and Gallatin - 2002-02-25 * VIA C3 - 2001 * AMD Athlon XP Thorough ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
RF CMOS
RF CMOS is a metal–oxide–semiconductor (MOS) integrated circuit (IC) technology that integrates radio-frequency (RF), analog and digital electronics on a mixed-signal CMOS (complementary MOS) RF circuit chip. It is widely used in modern wireless telecommunications, such as cellular networks, Bluetooth, Wi-Fi, GPS receivers, broadcasting, vehicular communication systems, and the radio transceivers in all modern mobile phones and wireless networking devices. RF CMOS technology was pioneered by Pakistani engineer Asad Ali Abidi at UCLA during the late 1980s to early 1990s, and helped bring about the wireless revolution with the introduction of digital signal processing in wireless communications. The development and design of RF CMOS devices was enabled by Aldert van der Ziel, van der Ziel's FET RF noise model, which was published in the early 1960s and remained largely forgotten until the 1990s. History Pakistani engineer Asad Ali Abidi, while working at Bell Labs and then ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
250 Nanometer
The 250 nm process (250 nanometer process or 0.25 μm process) is a level of semiconductor process technology that was reached by most manufacturers in the 1997–1998 timeframe. Products featuring 250 nm manufacturing process *The DEC Alpha 21264A, which was made commercially available in 1999. *The AMD K6-2 ''Chomper'' and ''Chomper Extended''. Chomper was released on May 28, 1998. *The AMD K6-III "Sharptooth" used 250 nm. *The mobile Pentium MMX '' Tillamook'', released in August 1997. *The Pentium II '' Deschutes''. *The Pentium III '' Katmai''. *The Dreamcast's CPU and GPU. *The initial version of the Emotion Engine processor used in the PlayStation 2 The PlayStation 2 (PS2) is a home video game console developed and marketed by Sony Interactive Entertainment, Sony Computer Entertainment. It was first released in Japan on 4 March 2000, in North America on 26 October, in Europe on 24 Novembe .... *00250 Computer-related introductions in ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
AS/400
The IBM AS/400 (Application System/400) is a family of midrange computers from IBM announced in June 1988 and released in August 1988. It was the successor to the System/36 and System/38 platforms, and ran the OS/400 operating system. Lower-cost but more powerful than its predecessors, an estimated 111,000 installations existed by the end of 1990 and annual revenue reaching $14 billion that year, increasing to 250,000 systems by 1994, and about 500,000 shipped by 1997. A key concept in the AS/400 platform is Technology Independent Machine Interface (TIMI), a platform-independent instruction set architecture (ISA) that is translated to native machine language instructions. The platform has used this capability to change the underlying processor architecture without breaking application compatibility. Early systems were based on a 48-bit CISC instruction set architecture known as the ''Internal Microprogrammed Interface'' (IMPI), originally developed for the System/38. In 1991, th ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Semiconductor Industry
The semiconductor industry is the aggregate of companies engaged in the design and fabrication of semiconductors and semiconductor devices, such as transistors and integrated circuits. Its roots can be traced to the invention of the transistor by Shockley, Brattain, and Bardeen at Bell Labs in 1948. Bell Labs licensed the technology for $25,000, and soon many companies, including Motorola (1952), Schockley Semiconductor (1955), Sylvania, Centralab, Fairchild Semiconductor and Texas Instruments were making transistors. In 1958 Jack Kilby of Texas Instruments and Robert Noyce of Fairchild independently invented the Integrated Circuit, a method of producing multiple transistors on a single "chip" of Semiconductor material. This kicked off a number of rapid advances in fabrication technology leading to the exponential growth in semiconductor device production, known as Moore's law that has persisted over the past six or so decades. The industry's annual semiconductor sale ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
