Resolution enhancement technologiesResolution enhancement technologies are methods used to modify the photomasks in the lithographic processes used to make integrated circuits (ICs or "chips") to compensate for limitations in the optical resolution of the projection systems. These processes allow the creation of features well beyond the limit that would normally apply due to the Rayleigh criterion.
Integrated circuit layoutIn integrated circuit design, integrated circuit (IC) layout, also known IC mask layout or mask design, is the representation of an integrated circuit in terms of planar geometric shapes which correspond to the patterns of metal, oxide, or semiconductor layers that make up the components of the integrated circuit.
Optical proximity correctionOptical proximity correction (OPC) is a photolithography enhancement technique commonly used to compensate for image errors due to diffraction or process effects. The need for OPC is seen mainly in the making of semiconductor devices and is due to the limitations of light to maintain the edge placement integrity of the original design, after processing, into the etched image on the silicon wafer.Open Artwork System Interchange StandardOpen Artwork System Interchange Standard (OASIS) is a binary file format used for specification of data structures for photomask production. It's used to represent a pattern an interchange and encapsulation format for hierarchical integrated circuit mask layout information produced during integrated circuit design that is further used for manufacturing of a photomask. The standard is developed by SEMI.
PhotomaskA photomask (also simply called a mask) is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are commonly used in photolithography for the production of integrated circuits (ICs or "chips") to produce a pattern on a thin wafer of material (usually silicon). In semiconductor manufacturing, a mask is sometimes called a reticle.
Physical design (electronics)In integrated circuit design, physical design is a step in the standard design cycle which follows after the circuit design. At this step, circuit representations of the components (devices and interconnects) of the design are converted into geometric representations of shapes which, when manufactured in the corresponding layers of materials, will ensure the required functioning of the components. This geometric representation is called an integrated circuit layout.
GDSIIGDSII stream format (GDSII), is a binary database file format which is the de facto industry standard for electronic design automation (EDA) data exchange of integrated circuit (IC) or IC layout artwork. It is a binary file format representing planar geometric shapes, text labels, and other information about the layout in hierarchical form (two-dimensional/2D CAD file format).Tape-outIn electronics and photonics design, tape-out or tapeout is the final stage of the design process for integrated circuits or printed circuit boards before they are sent for manufacturing. The tapeout is specifically the point at which the graphic for the photomask of the circuit is sent to the fabrication facility. The name originates from the use of magnetic tape to send the data to the manufacturing facility.Place and routePlace and route (also called PnR or P&R) is a stage in the design of printed circuit boards, integrated circuits, and field-programmable gate arrays. As implied by the name, it is composed of two steps, placement and routing. The first step, placement, involves deciding where to place all electronic components, circuitry, and logic elements in a generally limited amount of space.
Read-only memoryRead-only memory (ROM) is a form of non-volatile memory used in computers and other electronic devices. Data stored in ROM cannot be electronically modified after the manufacture of the memory device. Read-only memory is useful for storing software that is rarely changed during the life of the system, also known as firmware. Software applications, such as video games, for programmable devices can be distributed as plug-in cartridges containing ROM.
Electronic design automationElectronic design automation (EDA), also referred to as electronic computer-aided design (ECAD), is a category of software tools for designing electronic systems such as integrated circuits and printed circuit boards. The tools work together in a design flow that chip designers use to design and analyze entire semiconductor chips. Since a modern semiconductor chip can have billions of components, EDA tools are essential for their design.Placement (electronic design automation)Placement is an essential step in electronic design automation — the portion of the physical design flow that assigns exact locations for various circuit components within the chip's core area. An inferior placement assignment will not only affect the chip's performance but might also make it non-manufacturable by producing excessive wire-length, which is beyond available routing resources.
Inverse lithographyIn semiconductor device fabrication, the inverse lithography technology (ILT) is an optical proximity correction approach to optimize photomask design. It is basically an approach to solve an inverse imaging problem: to calculate the shapes of the openings in a photomask ("source") so that the passing light produces a good approximation of the desired pattern ("target") on the illuminated material, typically a photoresist.
Integrated circuit layoutIn integrated circuit design, integrated circuit (IC) layout, also known IC mask layout or mask design, is the representation of an integrated circuit in terms of planar geometric shapes which correspond to the patterns of metal, oxide, or semiconductor layers that make up the components of the integrated circuit.Optical proximity correctionOptical proximity correction (OPC) is a photolithography enhancement technique commonly used to compensate for image errors due to diffraction or process effects. The need for OPC is seen mainly in the making of semiconductor devices and is due to the limitations of light to maintain the edge placement integrity of the original design, after processing, into the etched image on the silicon wafer.Open Artwork System Interchange StandardOpen Artwork System Interchange Standard (OASIS) is a binary file format used for specification of data structures for photomask production. It's used to represent a pattern an interchange and encapsulation format for hierarchical integrated circuit mask layout information produced during integrated circuit design that is further used for manufacturing of a photomask. The standard is developed by SEMI.PhotomaskA photomask (also simply called a mask) is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are commonly used in photolithography for the production of integrated circuits (ICs or "chips") to produce a pattern on a thin wafer of material (usually silicon). In semiconductor manufacturing, a mask is sometimes called a reticle.Physical design (electronics)In integrated circuit design, physical design is a step in the standard design cycle which follows after the circuit design. At this step, circuit representations of the components (devices and interconnects) of the design are converted into geometric representations of shapes which, when manufactured in the corresponding layers of materials, will ensure the required functioning of the components. This geometric representation is called an integrated circuit layout.GDSIIGDSII stream format (GDSII), is a binary database file format which is the de facto industry standard for electronic design automation (EDA) data exchange of integrated circuit (IC) or IC layout artwork. It is a binary file format representing planar geometric shapes, text labels, and other information about the layout in hierarchical form (two-dimensional/2D CAD file format).Tape-outIn electronics and photonics design, tape-out or tapeout is the final stage of the design process for integrated circuits or printed circuit boards before they are sent for manufacturing. The tapeout is specifically the point at which the graphic for the photomask of the circuit is sent to the fabrication facility. The name originates from the use of magnetic tape to send the data to the manufacturing facility.Place and routePlace and route (also called PnR or P&R) is a stage in the design of printed circuit boards, integrated circuits, and field-programmable gate arrays. As implied by the name, it is composed of two steps, placement and routing. The first step, placement, involves deciding where to place all electronic components, circuitry, and logic elements in a generally limited amount of space.Read-only memoryRead-only memory (ROM) is a form of non-volatile memory used in computers and other electronic devices. Data stored in ROM cannot be electronically modified after the manufacture of the memory device. Read-only memory is useful for storing software that is rarely changed during the life of the system, also known as firmware. Software applications, such as video games, for programmable devices can be distributed as plug-in cartridges containing ROM.Electronic design automationElectronic design automation (EDA), also referred to as electronic computer-aided design (ECAD), is a category of software tools for designing electronic systems such as integrated circuits and printed circuit boards. The tools work together in a design flow that chip designers use to design and analyze entire semiconductor chips. Since a modern semiconductor chip can have billions of components, EDA tools are essential for their design.Placement (electronic design automation)Placement is an essential step in electronic design automation — the portion of the physical design flow that assigns exact locations for various circuit components within the chip's core area. An inferior placement assignment will not only affect the chip's performance but might also make it non-manufacturable by producing excessive wire-length, which is beyond available routing resources.Inverse lithographyIn semiconductor device fabrication, the inverse lithography technology (ILT) is an optical proximity correction approach to optimize photomask design. It is basically an approach to solve an inverse imaging problem: to calculate the shapes of the openings in a photomask ("source") so that the passing light produces a good approximation of the desired pattern ("target") on the illuminated material, typically a photoresist.*As an Amazon Associate I earn from qualifying purchases.