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Plasma Etching
Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (Plasma (physics), plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radical (chemistry), radicals). During the process, the plasma generates volatile etch products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma. Eventually the atoms of the shot element embed themselves at or just below the surface of the target, thus modifying the physical properties of the target. Mechanisms Plasma generation A plasma is a high energetic condition in which a lot of processes can occur. These processes happen because of electrons and atoms. To form the plasma electrons have to be accelerated to gain energy. Highly energetic electrons transfer the energy to ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Plasma Processing
Plasma processing is a plasma-based material processing technology that aims at modifying the chemical and physical properties of a surface. Plasma processing techniques include: *Plasma activation * Plasma ashing * Plasma cleaning * Plasma electrolytic oxidation *Plasma etching * Plasma functionalization * Plasma polymerization *Corona treatment *Plasma modification Related topics are plasma chemistry, chemical vapor deposition, and physical vapor deposition Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polym ... processes like sputter deposition, plasma iondoping, vacuum plasmaspraying, and reactive ion etching. References {{DEFAULTSORT:Plasma Processing ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Microwave Plasma Etching
Microwave is a form of electromagnetic radiation with wavelengths shorter than other radio waves but longer than infrared waves. Its wavelength ranges from about one meter to one millimeter, corresponding to frequencies between 300 MHz and 300 GHz, broadly construed. A more common definition in radio-frequency engineering is the range between 1 and 100 GHz (wavelengths between 30 cm and 3 mm), or between 1 and 3000 GHz (30 cm and 0.1 mm). In all cases, microwaves include the entire super high frequency (SHF) band (3 to 30 GHz, or 10 to 1 cm) at minimum. The boundaries between far infrared, terahertz radiation, microwaves, and ultra-high-frequency (UHF) are fairly arbitrary and differ between different fields of study. The prefix ' in ''microwave'' indicates that microwaves are small (having shorter wavelengths), compared to the radio waves used in prior radio technology. Frequencies in the microwave range are often referred ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Silicon Dioxide
Silicon dioxide, also known as silica, is an oxide of silicon with the chemical formula , commonly found in nature as quartz. In many parts of the world, silica is the major constituent of sand. Silica is one of the most complex and abundant families of materials, existing as a compound of several minerals and as a synthetic product. Examples include fused quartz, fumed silica, opal, and aerogels. It is used in structural materials, microelectronics, and as components in the food and pharmaceutical industries. All forms are white or colorless, although impure samples can be colored. Silicon dioxide is a common fundamental constituent of glass. Structure In the majority of silicon dioxides, the silicon atom shows tetrahedral coordination, with four oxygen atoms surrounding a central Si atomsee 3-D Unit Cell. Thus, SiO2 forms 3-dimensional network solids in which each silicon atom is covalently bonded in a tetrahedral manner to 4 oxygen atoms. In contrast, CO2 is a li ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Optical Materials Express
''Optical Materials Express'' is a monthly peer-reviewed scientific journal published by Optica. It covers advances in and applications of optical materials, including but not limited to nonlinear optical materials, laser media, nanomaterials, metamaterials and biomaterials. Its editor-in-chief is Andrea Alù (City University of New York). The founding editor-in-chief was David J. Hagan. According to the ''Journal Citation Reports'', the journal has a 2023 impact factor The impact factor (IF) or journal impact factor (JIF) of an academic journal is a type of journal ranking. Journals with higher impact factor values are considered more prestigious or important within their field. The Impact Factor of a journa ... of 2.8. References External links * Optics journals Materials science journals English-language journals Monthly journals Academic journals established in 2011 Optica (society) academic journals {{materials-journal-stub ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Microelectromechanical Systems
MEMS (micro-electromechanical systems) is the technology of microscopic devices incorporating both electronic and moving parts. MEMS are made up of components between 1 and 100 micrometres in size (i.e., 0.001 to 0.1 mm), and MEMS devices generally range in size from 20 micrometres to a millimetre (i.e., 0.02 to 1.0 mm), although components arranged in arrays (e.g., digital micromirror devices) can be more than 1000 mm2. They usually consist of a central unit that processes data (an integrated circuit chip such as microprocessor) and several components that interact with the surroundings (such as microsensors). Because of the large surface area to volume ratio of MEMS, forces produced by ambient electromagnetism (e.g., electrostatic charges and magnetic moments), and fluid dynamics (e.g., surface tension and viscosity) are more important design considerations than with larger scale mechanical devices. MEMS technology is distinguished from molecular nanotechnol ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Double Layer (plasma)
A double layer is a structure in a plasma consisting of two parallel layers of opposite electrical charge. The sheets of charge, which are not necessarily planar, produce localised excursions of electric potential, resulting in a relatively strong electric field between the layers and weaker but more extensive compensating fields outside, which restore the global potential. Ions and electrons within the double layer are accelerated, decelerated, or deflected by the electric field, depending on their direction of motion. Double layers can be created in discharge tubes, where sustained energy is provided within the layer for electron acceleration by an external power source. Double layers are claimed to have been observed in the aurora and are invoked in astrophysical applications. Similarly, a double layer in the auroral region requires some external driver to produce electron acceleration. Electrostatic double layers are especially common in current-carrying plasmas, and are ver ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Debye Sheath
The Debye sheath (also electrostatic sheath) is a layer in a plasma which has a greater density of positive ions, and hence an overall excess positive charge, that balances an opposite negative charge on the surface of a material with which it is in contact. The thickness of such a layer is several Debye lengths thick, a value whose size depends on various characteristics of plasma (e.g. temperature, density, etc.). A Debye sheath arises in a plasma because the electrons usually have a temperature on the order of magnitude or greater than that of the ions and are much lighter. Consequently, they are faster than the ions by at least a factor of \sqrt. At the interface to a material surface, therefore, the electrons will fly out of the plasma, charging the surface negative relative to the bulk plasma. Due to Debye shielding, the scale length of the transition region will be the Debye length \lambda_\mathrm. As the potential increases, more and more electrons are reflected by the she ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Dielectric Breakdown
In electronics, electrical breakdown or dielectric breakdown is a process that occurs when an electrically insulating material (a dielectric), subjected to a high enough voltage, suddenly becomes a conductor and current flows through it. All insulating materials undergo breakdown when the electric field caused by an applied voltage exceeds the material's dielectric strength. The voltage at which a given insulating object becomes conductive is called its '' breakdown voltage'' and, in addition to its dielectric strength, depends on its size and shape, and the location on the object at which the voltage is applied. Under sufficient voltage, electrical breakdown can occur within solids, liquids, or gases (and theoretically even in a vacuum). However, the specific breakdown mechanisms are different for each kind of dielectric medium. Electrical breakdown may be a momentary event (as in an electrostatic discharge), or may lead to a continuous electric arc if protective devices ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Silicon Wafer
In electronics, a wafer (also called a slice or substrate) is a thin slice of semiconductor, such as a crystalline silicon (c-Si, silicium), used for the fabrication of integrated circuits and, in photovoltaics, to manufacture solar cells. The wafer serves as the substrate for microelectronic devices built in and upon the wafer. It undergoes many microfabrication processes, such as doping, ion implantation, etching, thin-film deposition of various materials, and photolithographic patterning. Finally, the individual microcircuits are separated by wafer dicing and packaged as an integrated circuit. History In the semiconductor industry, the term wafer appeared in the 1950s to describe a thin round slice of semiconductor material, typically germanium or silicon. The round shape characteristic of these wafers comes from single-crystal ingots usually produced using the Czochralski method. Though, silicon wafers were first introduced in the 1940s. By 1960, silicon wafers were ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
ISM Band
The ISM radio bands are portions of the radio spectrum reserved internationally for ''industrial, scientific, and medical'' (ISM) purposes, excluding applications in telecommunications. Examples of applications for the use of radio frequency (RF) energy in these bands include RF heating, microwave ovens, and medical diathermy machines. The powerful emissions of these devices can create electromagnetic interference and disrupt radio communication using the same frequency, so these devices are limited to certain bands of frequencies. In general, communications equipment operating in ISM bands must tolerate any interference generated by ISM applications, and users have no regulatory protection from ISM device operation in these bands. Despite the intent of the original allocations, in recent years the fastest-growing use of these bands has been for short-range, low-power wireless communications systems, since these bands are often approved for such devices, which can be used w ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Electric Field
An electric field (sometimes called E-field) is a field (physics), physical field that surrounds electrically charged particles such as electrons. In classical electromagnetism, the electric field of a single charge (or group of charges) describes their capacity to exert attractive or repulsive forces on another charged object. Charged particles exert attractive forces on each other when the sign of their charges are opposite, one being positive while the other is negative, and repel each other when the signs of the charges are the same. Because these forces are exerted mutually, two charges must be present for the forces to take place. These forces are described by Coulomb's law, which says that the greater the magnitude of the charges, the greater the force, and the greater the distance between them, the weaker the force. Informally, the greater the charge of an object, the stronger its electric field. Similarly, an electric field is stronger nearer charged objects and weaker f ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Fluorine
Fluorine is a chemical element; it has Chemical symbol, symbol F and atomic number 9. It is the lightest halogen and exists at Standard temperature and pressure, standard conditions as pale yellow Diatomic molecule, diatomic gas. Fluorine is extremely Reactivity (chemistry), reactive as it reacts with all other Periodic table, elements except for the light Noble gas, noble gases. It is highly toxicity, toxic. Among the elements, fluorine ranks Abundance of the chemical elements, 24th in cosmic abundance and 13th in crustal abundance. Fluorite, the primary mineral source of fluorine, which gave the element its name, was first described in 1529; as it was added to metal ores to lower their melting points for smelting, the Latin verb meaning gave the mineral its name. Proposed as an element in 1810, fluorine proved difficult and dangerous to separate from its compounds, and several early experimenters died or sustained injuries from their attempts. Only in 1886 did French chemist He ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
