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14 Nm
The "14 nanometer process" refers to a marketing term for the MOSFET technology node that is the successor to the "22nm" (or "20nm") node. The "14nm" was so named by the International Technology Roadmap for Semiconductors (ITRS). Until about 2011, the node following "22nm" was expected to be "16nm". All "14nm" nodes use FinFET (fin field-effect transistor) technology, a type of multi-gate MOSFET technology that is a non-planar evolution of planar silicon CMOS technology. Since at least 1997, "process nodes" have been named purely on a marketing basis, and have no relation to the dimensions on the integrated circuit; neither gate length, metal pitch or gate pitch on a "14nm" device is fourteen nanometers. For example, TSMC and Samsung's "10 nm" processes are somewhere between Intel's "14 nm" and "10 nm" processes in transistor density, and TSMC's " 7 nm" processes are dimensionally similar to Intel's "10 nm" process. Samsung Electronics taped out ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
MOSFET
upright=1.3, Two power MOSFETs in amperes">A in the ''on'' state, dissipating up to about 100 watt">W and controlling a load of over 2000 W. A matchstick is pictured for scale. In electronics, the metal–oxide–semiconductor field-effect transistor (MOSFET, MOS-FET, MOS FET, or MOS transistor) is a type of field-effect transistor (FET), most commonly fabricated by the controlled oxidation of silicon. It has an insulated gate, the voltage of which determines the conductivity of the device. This ability to change conductivity with the amount of applied voltage can be used for amplifying or switching electronic signals. The term ''metal–insulator–semiconductor field-effect transistor'' (''MISFET'') is almost synonymous with ''MOSFET''. Another near-synonym is ''insulated-gate field-effect transistor'' (''IGFET''). The main advantage of a MOSFET is that it requires almost no input current to control the load current under steady-state or low-frequency conditions ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Resist
A resist, used in many areas of manufacturing and art, is something that is added to parts of an object to create a pattern by protecting these parts from being affected by a subsequent stage in the process. Often the resist is then removed. For example in the resist dyeing of textiles, wax or a similar substance is added to places where the dye is not wanted. The wax will "resist" the dye, and after it is removed there will be a pattern in two colours. Batik, '' shibori'' and tie-dye are among many styles of resist dyeing. Wax or grease can also be used as a resist in pottery, to keep some areas free from a ceramic glaze; the wax burns away when the piece is fired. Song dynasty Jizhou ware used paper cut-outs and leaves as resists or stencils under glaze to create patterns. Other uses of resists in pottery work with slip or paints, and a whole range of modern materials used as resists. A range of similar techniques can be used in watercolour and other forms of painting. W ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Arizona
Arizona is a U.S. state, state in the Southwestern United States, Southwestern region of the United States, sharing the Four Corners region of the western United States with Colorado, New Mexico, and Utah. It also borders Nevada to the northwest and California to the west, and shares Mexico-United States border, an international border with the Mexican states of Sonora and Baja California to the south and southwest. Its Capital city, capital and List of largest cities, largest city is Phoenix, Arizona, Phoenix, which is the most populous state capital and list of United States cities by population, fifth most populous city in the United States. Arizona is divided into 15 List of counties in Arizona, counties. Arizona is the list of U.S. states and territories by area, 6th-largest state by area and the list of U.S. states and territories by population, 14th-most-populous of the 50 states. It is the 48th state and last of the contiguous United States, contiguous states to be a ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Semiconductor Fabrication Plant
In the microelectronics industry, a semiconductor fabrication plant, also called a ''fab'' or a ''foundry'', is a factory where integrated circuits (ICs) are manufactured. The ''cleanroom'' is where all fabrication takes place and contains the machinery for integrated circuit production such as steppers and/or scanners for photolithography, etching, cleaning, and doping. All these devices are extremely precise and thus extremely expensive. Prices for pieces of equipment for the processing of 300 mm wafers range to upwards of $4,000,000 each with a few pieces of equipment reaching as high as $340,000,000 (e.g. EUV scanners). A typical fab will have several hundred equipment items. Semiconductor fabrication requires many expensive devices. Estimates put the cost of building a new fab at over one billion U.S. dollars with values as high as $3–4 billion not being uncommon. For example, TSMC invested $9.3 billion in its ''Fab15'' in Taiwan. The same company estimations ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Arm Holdings
Arm Holdings plc (formerly an acronym for Advanced RISC Machines and originally Acorn RISC Machine) is a British semiconductor and software design company based in Cambridge, England, whose primary business is the design of central processing unit (CPU) cores that implement the ARM architecture family of instruction sets. It also designs other chips, provides software development tools under the DS-5, RealView and Keil brands, and provides systems and platforms, system-on-a-chip (SoC) infrastructure and software. As a "holding" company, it also holds shares of other companies. Since 2016, it has been majority owned by Japanese conglomerate SoftBank Group. While ARM CPUs first appeared in the Acorn Archimedes, a desktop computer, today's systems include mostly embedded systems, including ARM CPUs used in virtually all modern smartphones. Processors based on designs licensed from Arm, or designed by licensees of one of the ARM instruction set architectures, are used in all ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Mentor Graphics
Mentor Graphics Corporation was a US-based electronic design automation (EDA) multinational corporation for electrical engineering and electronics, headquartered in Wilsonville, Oregon. Founded in 1981, the company distributed products that assist in electronic design automation, simulation tools for analog mixed-signal design, VPN solutions, and fluid dynamics and heat transfer tools. The company leveraged Apollo Computer workstations to differentiate itself within the computer-aided engineering (CAE) market with its software and hardware. Mentor Graphics was acquired by Siemens in 2017. The name was retired in 2021 and renamed Siemens EDA, a segment of Siemens Digital Industries Software. History Mentor Graphics was founded in 1981 by Tom Bruggere, Gerry Langeler, and Dave Moffenbeier, all formerly of Tektronix. The company raised $55 million in funding through an initial public offering in 1984. Mentor initially wrote software that ran only in Apollo workstation ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Synopsys
Synopsys, Inc. is an American electronic design automation (EDA) company headquartered in Sunnyvale, California, that focuses on silicon design and verification, silicon intellectual property and software security and quality. Synopsys supplies tools and services to the semiconductor design and manufacturing industry. Products include tools for logic synthesis and physical design of integrated circuits, simulators for development, and debugging environments that assist in the design of the logic for chips and computer systems. History Synopsys was founded by Aart de Geus, David Gregory, Alberto Sangiovanni-Vincentelli and Bill Krieger in 1986 in Research Triangle Park, North Carolina. The company was initially established as Optimal Solutions with a charter to develop and market logic synthesis technology developed by the team at General Electric's Advanced Computer-Aided Engineering Group. The company changed its name to Synopsys and moved to Mountain View, Califo ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Leakage (electronics)
In electronics, leakage is the gradual transfer of electrical energy across a boundary normally viewed as insulating, such as the spontaneous discharge of a charged capacitor, magnetic coupling of a transformer with other components, or flow of current across a transistor in the "off" state or a reverse-polarized diode. In capacitors Gradual loss of energy from a charged capacitor is primarily caused by electronic devices attached to the capacitors, such as transistors or diodes, which conduct a small amount of current even when they are turned off. Even though this off current is an order of magnitude less than the current through the device when it is on, the current still slowly discharges the capacitor. Another contributor to leakage from a capacitor is from the undesired imperfection of some dielectric materials used in capacitors, also known as ''dielectric leakage''. It is a result of the dielectric material not being a perfect insulator and having some non-zero conducti ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Low-κ Dielectric
In semiconductor manufacturing, a low-κ is a material with a small relative dielectric constant (κ, kappa) relative to silicon dioxide. Low-κ dielectric material implementation is one of several strategies used to allow continued scaling of microelectronic devices, colloquially referred to as extending Moore's law. In digital circuits, insulating dielectrics separate the conducting parts (wire interconnects and transistors) from one another. As components have scaled and transistors have gotten closer together, the insulating dielectrics have thinned to the point where charge build up and crosstalk adversely affect the performance of the device. Replacing the silicon dioxide with a low-κ dielectric of the same thickness reduces parasitic capacitance, enabling faster switching speeds (in case of synchronous circuits) and lower heat dissipation. In conversation such materials may be referred to as "low-k" (spoken "low-kay") rather than "low-κ" (low-kappa). Low-κ materials ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Multiple Patterning
Multiple patterning (or multi-patterning) is a class of technologies for manufacturing integrated circuits (ICs), developed for photolithography to enhance the feature density. It is expected to be necessary for the 10 nm and 7 nm node semiconductor processes and beyond. The premise is that a single lithographic exposure may not be enough to provide sufficient resolution. Hence additional exposures would be needed, or else positioning patterns using etched feature sidewalls (using spacers) would be necessary. Even with single exposure having sufficient resolution, extra masks have been implemented for better patterning quality such as by Intel for line-cutting at its 45nm node or TSMC at its 28nm node. Even for electron-beam lithography, single exposure appears insufficient at ~10 nm half-pitch, hence requiring double patterning. Double patterning lithography was first demonstrated in 1983 by D. C. Flanders and N. N. Efremow. Since then several double patterning te ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Hardmask
A hardmask is a material used in semiconductor processing as an etch mask instead of a polymer or other organic "soft" resist material. Hardmasks are necessary when the material being etched is itself an organic polymer. Anything used to etch this material will also etch the photoresist being used to define its patterning since that is also an organic polymer. This arises, for instance, in the patterning of low-κ dielectric insulation layers used in VLSI fabrication. Polymers tend to be etched easily by oxygen, fluorine, chlorine and other reactive gases used in plasma etching. Use of a hardmask involves an additional deposition process, and hence additional cost. First, the hardmask material is deposited and etched into the required pattern using a standard photoresist process. Following that the underlying material can be etched through the hardmask. Finally the hardmask is removed with a further etching process. Hardmask materials can be metal or dielectric. Silicon ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Immersion Lithography
Immersion lithography is a technique used in semiconductor manufacturing to enhance the resolution and accuracy of the lithographic process. It involves using a liquid medium, typically water, between the lens and the wafer during exposure. By using a liquid with a higher refractive index than air, immersion lithography allows for smaller features to be created on the wafer. Immersion lithography replaces the usual air gap between the final lens and the wafer surface with a liquid medium that has a refractive index greater than one. The angular resolution is increased by a factor equal to the refractive index of the liquid. Current immersion lithography tools use highly purified water for this liquid, achieving feature sizes below 45 nanometers. Background The ability to resolve features in optical lithography is directly related to the numerical aperture of the imaging equipment, the numerical aperture being the sine of the maximum refraction angle multiplied by the refracti ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
