Tungsten silicide (WSi₂) is an inorganic compound, a

silicide A silicide is a type of chemical compound that combines silicon and a (usually) more electropositive element. Silicon is more electropositive than carbon. Silicides are structurally closer to borides than to carbides. Similar to borides and carb ...

tungsten Tungsten, or wolfram, is a chemical element with the symbol W and atomic number 74. Tungsten is a rare metal found naturally on Earth almost exclusively as compounds with other elements. It was identified as a new element in 1781 and first isol ...

. It is an electrically conductive

ceramic A ceramic is any of the various hard, brittle, heat-resistant and corrosion-resistant materials made by shaping and then firing an inorganic, nonmetallic material, such as clay, at a high temperature. Common examples are earthenware, porcelain ...

material.

Chemistry

Tungsten silicide can react violently with substances such as

strong acid Acid strength is the tendency of an acid, symbolised by the chemical formula HA, to dissociate into a proton, H+, and an anion, A-. The dissociation of a strong acid in solution is effectively complete, except in its most concentrated solutions ...

s, fluorine,

oxidizer An oxidizing agent (also known as an oxidant, oxidizer, electron recipient, or electron acceptor) is a substance in a redox chemical reaction that gains or " accepts"/"receives" an electron from a (called the , , or ). In other words, an oxid ...

s, and

interhalogen In chemistry, an interhalogen compound is a molecule which contains two or more different halogen atoms ( fluorine, chlorine, bromine, iodine, or astatine) and no atoms of elements from any other group. Most interhalogen compounds known are b ...

Applications

It is used in

microelectronics Microelectronics is a subfield of electronics. As the name suggests, microelectronics relates to the study and manufacture (or microfabrication) of very small electronic designs and components. Usually, but not always, this means micrometre-s ...

as a contact material, with

resistivity Electrical resistivity (also called specific electrical resistance or volume resistivity) is a fundamental property of a material that measures how strongly it resists electric current. A low resistivity indicates a material that readily allows ...

60–80 μΩ cm; it forms at 1000 °C. It is often used as a shunt over

polysilicon Polycrystalline silicon, or multicrystalline silicon, also called polysilicon, poly-Si, or mc-Si, is a high purity, polycrystalline form of silicon, used as a raw material by the solar photovoltaic and electronics industry. Polysilicon is produce ...

lines to increase their conductivity and increase signal speed. Tungsten silicide layers can be prepared by chemical vapor deposition, e.g. using

monosilane Silane is an inorganic compound with chemical formula, . It is a colourless, pyrophoric, toxic gas with a sharp, repulsive smell, somewhat similar to that of acetic acid. Silane is of practical interest as a precursor to elemental silicon. Sila ...

or dichlorosilane with tungsten hexafluoride as source gases. The deposited film is non-

stoichiometric Stoichiometry refers to the relationship between the quantities of reactants and products before, during, and following chemical reactions. Stoichiometry is founded on the law of conservation of mass where the total mass of the reactants equ ...

, and requires annealing to convert to more conductive stoichiometric form. Tungsten silicide is a replacement for earlier tungsten films. Tungsten silicide is also used as a

barrier layer A diffusion barrier is a thin layer (usually micrometres thick) of metal usually placed between two other metals. It is done to act as a barrier to protect either one of the metals from corrupting the other.. Adhesion of a plated metal layer to it ...

between silicon and other metals, e.g. tungsten. Tungsten silicide is also of value towards use in microelectromechanical systems, where it is mostly applied as thin films for fabrication of microscale circuits. For such purposes, films of tungsten silicide can be plasma-etched using e.g. nitrogen trifluoride gas. WSi₂ performs well in applications as

oxidation Redox (reduction–oxidation, , ) is a type of chemical reaction in which the oxidation states of substrate change. Oxidation is the loss of electrons or an increase in the oxidation state, while reduction is the gain of electrons or a ...

-resistant coatings. In particular, in similarity to

Molybdenum disilicide Molybdenum disilicide (MoSi2, or molybdenum silicide), an intermetallic compound, a silicide of molybdenum, is a refractory ceramic with primary use in heating elements. It has moderate density, melting point 2030 °C, and is electrically co ...

, MoSi₂, the high

emissivity The emissivity of the surface of a material is its effectiveness in emitting energy as thermal radiation. Thermal radiation is electromagnetic radiation that most commonly includes both visible radiation (light) and infrared radiation, which is n ...

of tungsten disilicide makes this material attractive for high temperature

radiative cooling In the study of heat transfer, radiative cooling is the process by which a body loses heat by thermal radiation. As Planck's law describes, every physical body spontaneously and continuously emits electromagnetic radiation. Radiative cooling ...

, with implications in heat shields.High emissivity coatings on fibrous ceramics for reusable space systems
Corrosion Science 2019

References

{{Silicides Ceramic materials Group 6 silicides Refractory materials Semiconductor materials Tungsten compounds