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Hydrofluoric Acid
Hydrofluoric acid is a solution of hydrogen fluoride (HF) in water. Solutions of HF are colourless, acidic and highly corrosive. It is used to make most fluorine-containing compounds; examples include the commonly used pharmaceutical antidepressant medication fluoxetine (Prozac) and the material PTFE (Teflon). Elemental fluorine is produced from it. It is commonly used to etch glass and silicon wafers. Uses Production of organofluorine compounds The principal use of hydrofluoric acid is in organofluorine chemistry. Many organofluorine compounds are prepared using HF as the fluorine source, including Teflon, fluoropolymers, fluorocarbons, and refrigerants such as freon. Many pharmaceuticals contain fluorine. Production of inorganic fluorides Most high-volume inorganic fluoride compounds are prepared from hydrofluoric acid. Foremost are Na3AlF6, cryolite, and AlF3, aluminium trifluoride. A molten mixture of these solids serves as a high-temperature solvent for the prod ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Car Wash
A car wash, carwash, or auto wash is a facility used to clean the exterior, and in some cases the interior of motor vehicles. Car washes can be self-service, full-service (with attendants who wash the vehicle), or fully automated (possibly connected to a gas station). Car washes may also be events where people pay to have their cars washed by volunteers, often using less specialized equipment, as a method to raise money for some purpose. History 1946 The history of commercial car washes in the United States began in 1914. People used manpower to push or move the cars through stages of the process. The name is credited to Automobile Laundry in Detroit, Michigan, opened in 1914 by Frank McCormick and J.W. Hinkle . Manual car wash operations peaked at 32 drive-through facilities in the United States. The first semi-automatic car wash in the United States made its debut in 1946. A facility in Detroit, Michigan, used automatic pulley systems and manual brushing. 1955 Dan ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Cryolite
Cryolite ( Na3 Al F6, sodium hexafluoroaluminate) is an uncommon mineral identified with the once-large deposit at Ivittuut on the west coast of Greenland, mined commercially until 1987. History Cryolite was first described in 1798 by Danish veterinarian and physician Peder Christian Abildgaard (1740–1801); it was obtained from a deposit of it in Ivigtut (old spelling) and nearby Arsuk Fjord, Southwest Greenland. The name is derived from the Greek language words ''κρύος'' (cryos) = frost, and ''λίθος'' (lithos) = stone. The Pennsylvania Salt Manufacturing Company used large amounts of cryolite to make caustic soda and fluorine compounds, including hydrofluoric acid at its Natrona, Pennsylvania works, and at its integrated chemical plant in Cornwells Heights, Pennsylvania, during the 19th and 20th centuries. It was historically used as an ore of aluminium and later in the electrolytic processing of the aluminium-rich oxide ore bauxite (itself a combination of alumin ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Hexafluorosilicic Acid
Hexafluorosilicic acid is an inorganic compound with the chemical formula . Aqueous solutions of hexafluorosilicic acid consist of salts of the cation and hexafluorosilicate anion. These salts and their aqueous solutions are colorless. Hexafluorosilicic acid is produced naturally on a large scale in volcanoes.Palache, C., Berman, H., and Frondel, C. (1951) Dana’s System of Mineralogy, Volume II: Halides, Nitrates, Borates, Carbonates, Sulfates, Phosphates, Arsenates, Tungstates, Molybdates, etc. John Wiley and Sons, Inc., New York, 7th edition.Anthony, J.W., Bideaux, R.A., Bladh, K.W., and Nichols, M.C. (1997) Handbook of Mineralogy, Volume III: Halides, Hydroxides, Oxides. Mineral Data Publishing, Tucson.link to bararite It is manufactured as a coproduct in the production of phosphate fertilizers. The resulting hexafluorosilicic acid is almost exclusively consumed as a precursor to aluminum trifluoride and synthetic cryolite, which are used in aluminium processing. Salts d ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Silicon Tetrafluoride
Silicon tetrafluoride or tetrafluorosilane is a chemical compound with the formula Si F4. This colorless gas is notable for having a narrow liquid range: its boiling point is only 4 °C above its melting point. It was first prepared in 1771 by Carl Wilhelm Scheele by dissolving silica in hydrofluoric acid., later synthesized by John Davy in 1812. It is a tetrahedral molecule and is corrosive. Preparation is a by-product of the production of phosphate fertilizers wet process production, resulting from the attack of HF (derived from fluorapatite protonolysis) on silicates, which are present as impurities in the phosphate rocks. The hydrofluoric acid and silicon dioxide (SiO2) react to produce hexafluorosilicic acid: : 6 HF + SiO2 → H2SiF6 + 2 H2O In the laboratory, the compound is prepared by heating barium hexafluorosilicate (Ba iF6 above whereupon the solid releases volatile , leaving a residue of . : Alternatively, sodium hexafluorosilicate () may also ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Silicon Dioxide
Silicon dioxide, also known as silica, is an oxide of silicon with the chemical formula , most commonly found in nature as quartz and in various living organisms. In many parts of the world, silica is the major constituent of sand. Silica is one of the most complex and most abundant families of materials, existing as a compound of several minerals and as a synthetic product. Notable examples include fused quartz, fumed silica, silica gel, opal and aerogels. It is used in structural materials, microelectronics (as an electrical insulator), and as components in the food and pharmaceutical industries. Structure In the majority of silicates, the silicon atom shows tetrahedral coordination, with four oxygen atoms surrounding a central Si atomsee 3-D Unit Cell. Thus, SiO2 forms 3-dimensional network solids in which each silicon atom is covalently bonded in a tetrahedral manner to 4 oxygen atoms. In contrast, CO2 is a linear molecule. The starkly different structures of the d ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Glass Etching
Glass etching, or "French embossing", is a popular technique developed during the mid-1800s that is still widely used in both residential and commercial spaces today. Glass etching comprises the techniques of creating art on the surface of glass by applying acidic, caustic, or abrasive substances. Traditionally this is done after the glass is blown or cast, although mold-etching has replaced some forms of surface etching. The removal of minute amounts of glass causes the characteristic rough surface and translucent quality of frosted glass. Techniques Various techniques are used to achieve an etched surface in glass, whether for artistic effect, or simply to create a translucent surface. Acid etching is done using hexafluorosilicic acid (H2SiF6) which, when anhydrous, is colourless. The acid can be prepared by mixing quartz powder (silicon dioxide), calcium fluoride, and concentrated sulfuric acid; the acid forms after the resulting mixture is heated and the fumes (silicon tet ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Silicon Wafer
In electronics, a wafer (also called a slice or substrate) is a thin slice of semiconductor, such as a crystalline silicon (c-Si), used for the fabrication of integrated circuits and, in photovoltaics, to manufacture solar cells. The wafer serves as the substrate for microelectronic devices built in and upon the wafer. It undergoes many microfabrication processes, such as doping, ion implantation, etching, thin-film deposition of various materials, and photolithographic patterning. Finally, the individual microcircuits are separated by wafer dicing and packaged as an integrated circuit. History In the semiconductor or silicon wafer industry, the term wafer appeared in the 1950s to describe a thin round slice of semiconductor material, typically germanium or silicon. Round shape comes from single-crystal ingots usually produced using the Czochralski method. Silicon wafers were first introduced in the 1940s. By 1960, silicon wafers were being manufactured in the U.S. by ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Buffered Oxide Etch
Buffered oxide etch (BOE), also known as buffered HF or BHF, is a wet etchant used in microfabrication. Its primary use is in etching thin films of silicon dioxide (SiO2) or silicon nitride (Si3N4). It is a mixture of a buffering agent, such as ammonium fluoride (NH4F), and hydrofluoric acid (HF). Concentrated HF (typically 49% HF in water) etches silicon dioxide too quickly for good process control and also peels photoresist used in lithographic Lithography () is a planographic method of printing originally based on the immiscibility of oil and water. The printing is from a stone (lithographic limestone) or a metal plate with a smooth surface. It was invented in 1796 by the German a ... patterning. Buffered oxide etch is commonly used for more controllable etching. Some oxides produce insoluble products in HF solutions. Thus, HCl is often added to BHF solutions in order to dissolve these insoluble products and produce a higher quality etch. A common buffered oxide etc ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Wright Etch
The Wright etch (also Wright-Jenkins etch) is a preferential etch for revealing defects in - and -oriented, p- and n-type silicon wafers used for making transistors, microprocessors, memories, and other components. Revealing, identifying, and remedying such defects is essential for progress along the path predicted by Moore's Law. It was developed by Margaret Wright Jenkins (1936-2018) in 1976 while working in research and development at Motorola Inc. in Phoenix, AZ. It was published in 1977. This etchant reveals clearly defined oxidation-induced stacking faults, dislocations, swirls and striations with minimum surface roughness or extraneous pitting. These defects are known causes of shorts and current leakage in finished semiconductor devices (such as transistors) should they fall across isolated junctions. A relatively low etch rate (~1 micrometre per minute) at room temperature provides etch control. The long shelf life of this etchant allows the solution to be stored in large ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Semiconductor
A semiconductor is a material which has an electrical conductivity value falling between that of a conductor, such as copper, and an insulator, such as glass. Its resistivity falls as its temperature rises; metals behave in the opposite way. Its conducting properties may be altered in useful ways by introducing impurities (" doping") into the crystal structure. When two differently doped regions exist in the same crystal, a semiconductor junction is created. The behavior of charge carriers, which include electrons, ions, and electron holes, at these junctions is the basis of diodes, transistors, and most modern electronics. Some examples of semiconductors are silicon, germanium, gallium arsenide, and elements near the so-called " metalloid staircase" on the periodic table. After silicon, gallium arsenide is the second-most common semiconductor and is used in laser diodes, solar cells, microwave-frequency integrated circuits, and others. Silicon is a critical elem ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Wet Etching Tanks At LAAS (6 Inches) 0468
Wet may refer to: * Moisture, the condition of containing liquid or being covered or saturated in liquid * Wetting (or wetness), a measure of how well a liquid sticks to a solid rather than forming a sphere on the surface Wet or WET may also refer to: Arts and entertainment Games * ''Wet'' (video game), a 2009 video game * '' Wolfenstein: Enemy Territory'', a 2003 video game * '' Lula: The Sexy Empire'', also titled ''Wet: The Sexy Empire'', a 1998 computer game Music * Wet (band), an American indie pop group * ''Wet'' (album), by Barbra Streisand * "Wet" (Nicole Scherzinger song), a song from the album ''Killer Love'' (2011) * "Wet" (Snoop Dogg song), the lead single from the album ''Doggumentary'' * "Wet" (YFN Lucci song), the lead single from the mixtape ''Wish Me Well 3'' Other media * ''Wet'' (magazine), a magazine about "gourmet bathing" in the late 1970s Businesses * WET (company), a water feature design firm * Wet Lubricants, a brand of personal lubricants ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Uranium Hexafluoride
Uranium hexafluoride (), (sometimes called "hex") is an inorganic compound with the formula UF6. Uranium hexafluoride is a volatile white solid that reacts with water, releasing corrosive hydrofluoric acid. The compound reacts mildly with aluminium, forming a thin surface layer of AlF3 that resists any further reaction from the compound. UF6 is used in the process of enriching uranium, which produces fuel for nuclear reactors and nuclear weapons. Preparation Milled uranium ore—U3O8 or "yellowcake"—is dissolved in nitric acid, yielding a solution of uranyl nitrate UO2(NO3)2. Pure uranyl nitrate is obtained by solvent extraction, then treated with ammonia to produce ammonium diuranate ("ADU", (NH4)2U2O7). Reduction with hydrogen gives UO2, which is converted with hydrofluoric acid (HF) to uranium tetrafluoride, UF4. Oxidation with fluorine yields UF6. During nuclear reprocessing, uranium is reacted with chlorine trifluoride to give UF6: :U + 2 ClF3 → UF6 + Cl2 Prope ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
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