Hafnium(IV) oxide is the

inorganic compound In chemistry, an inorganic compound is typically a chemical compound that lacks carbon–hydrogen bonds, that is, a compound that is not an organic compound. The study of inorganic compounds is a subfield of chemistry known as '' inorganic chemist ...

with the

formula In science, a formula is a concise way of expressing information symbolically, as in a mathematical formula or a ''chemical formula''. The informal use of the term ''formula'' in science refers to the general construct of a relationship betwee ...

. Also known as hafnium dioxide or hafnia, this colourless solid is one of the most common and stable compounds of

hafnium Hafnium is a chemical element with the symbol Hf and atomic number 72. A lustrous, silvery gray, tetravalent transition metal, hafnium chemically resembles zirconium and is found in many zirconium minerals. Its existence was predicted by Dmitri M ...

. It is an electrical insulator with a

band gap In solid-state physics, a band gap, also called an energy gap, is an energy range in a solid where no electronic states can exist. In graphs of the electronic band structure of solids, the band gap generally refers to the energy difference (in ...

of 5.3~5.7 eV. Hafnium dioxide is an intermediate in some processes that give hafnium metal. Hafnium(IV) oxide is quite inert. It reacts with strong

acid In computer science, ACID ( atomicity, consistency, isolation, durability) is a set of properties of database transactions intended to guarantee data validity despite errors, power failures, and other mishaps. In the context of databases, a sequ ...

s such as concentrated

sulfuric acid Sulfuric acid (American spelling and the preferred IUPAC name) or sulphuric acid ( Commonwealth spelling), known in antiquity as oil of vitriol, is a mineral acid composed of the elements sulfur, oxygen and hydrogen, with the molecular formu ...

and with strong bases. It dissolves slowly in

hydrofluoric acid Hydrofluoric acid is a Solution (chemistry), solution of hydrogen fluoride (HF) in water. Solutions of HF are colourless, acidic and highly Corrosive substance, corrosive. It is used to make most fluorine-containing compounds; examples include th ...

to give fluorohafnate anions. At elevated temperatures, it reacts with

chlorine Chlorine is a chemical element with the Symbol (chemistry), symbol Cl and atomic number 17. The second-lightest of the halogens, it appears between fluorine and bromine in the periodic table and its properties are mostly intermediate betwee ...

in the presence of

graphite Graphite () is a crystalline form of the element carbon. It consists of stacked layers of graphene. Graphite occurs naturally and is the most stable form of carbon under standard conditions. Synthetic and natural graphite are consumed on large ...

carbon tetrachloride Carbon tetrachloride, also known by many other names (such as tetrachloromethane, also IUPAC nomenclature of inorganic chemistry, recognised by the IUPAC, carbon tet in the cleaning industry, Halon-104 in firefighting, and Refrigerant-10 in HVAC ...

to give

hafnium tetrachloride Hafnium(IV) chloride is the inorganic compound with the chemical formula, formula HfCl4. This colourless solid is the Precursor (chemistry), precursor to most hafnium organometallic compounds. It has a variety of highly specialized applications, m ...

Structure

Hafnia typically adopts the same structure as

zirconia Zirconium dioxide (), sometimes known as zirconia (not to be confused with zircon), is a white crystalline oxide of zirconium. Its most naturally occurring form, with a monoclinic crystalline structure, is the mineral baddeleyite. A dopant stabi ...

(ZrO₂). Unlike TiO₂, which features six-coordinate Ti in all phases, zirconia and hafnia consist of seven-coordinate metal centres. A variety of other crystalline phases have been experimentally observed, including cubic

fluorite Fluorite (also called fluorspar) is the mineral form of calcium fluoride, CaF2. It belongs to the halide minerals. It crystallizes in isometric cubic habit, although octahedral and more complex isometric forms are not uncommon. The Mohs sca ...

(Fmm), tetragonal (P4₂/nmc), monoclinic (P2₁/c) and orthorhombic (Pbca and Pnma). It is also known that hafnia may adopt two other orthorhombic metastable phases (space group Pca2₁ and Pmn2₁) over a wide range of pressures and temperatures, presumably being the sources of the ferroelectricity observed in thin films of hafnia. Thin films of hafnium oxides deposited by

atomic layer deposition Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. The majority of ALD reactions use two chemicals called precursors (also ...

are usually crystalline. Because

semiconductor A semiconductor is a material which has an electrical resistivity and conductivity, electrical conductivity value falling between that of a electrical conductor, conductor, such as copper, and an insulator (electricity), insulator, such as glas ...

devices benefit from having amorphous films present, researchers have alloyed hafnium oxide with aluminum or silicon (forming

hafnium silicate Hafnium silicate is the hafnium(IV) salt of silicic acid with the chemical formula of HfSiO4. Thin films of hafnium silicate and zirconium silicate grown by atomic layer deposition, chemical vapor deposition or MOCVD, can be used as a high-k di ...

s), which have a higher crystallization temperature than hafnium oxide.

Applications

Hafnia is used in

optical coating An optical coating is one or more thin layers of material deposited on an optical component such as a lens, prism or mirror, which alters the way in which the optic reflects and transmits light. These coatings have become a key technology in th ...

s, and as a

high-κ dielectric The term high-κ dielectric refers to a material with a high dielectric constant (κ, kappa), as compared to silicon dioxide. High-κ dielectrics are used in semiconductor manufacturing processes where they are usually used to replace a silicon dio ...

DRAM Dynamic random-access memory (dynamic RAM or DRAM) is a type of random-access semiconductor memory that stores each bit of data in a memory cell, usually consisting of a tiny capacitor and a transistor, both typically based on metal-oxid ...

capacitors and in advanced metal-oxide-semiconductor devices. Hafnium-based oxides were introduced by

Intel Intel Corporation is an American multinational corporation and technology company headquartered in Santa Clara, California. It is the world's largest semiconductor chip manufacturer by revenue, and is one of the developers of the x86 seri ...

in 2007 as a replacement for

silicon oxide Silicon oxide may refer to either of the following: *Silicon dioxide or quartz, SiO2, very well characterized *Silicon monoxide Silicon monoxide is the chemical compound with the formula SiO where silicon is present in the oxidation state +2. In ...

as a gate insulator in

field-effect transistors The field-effect transistor (FET) is a type of transistor that uses an electric field to control the flow of Electric current, current in a semiconductor. FETs (JFETs or MOSFETs) are devices with three terminals: ''source'', ''gate'', and ''dra ...

. The advantage for transistors is its high

dielectric constant The relative permittivity (in older texts, dielectric constant) is the permittivity of a material expressed as a ratio with the electric permittivity of a vacuum. A dielectric is an insulating material, and the dielectric constant of an insulat ...

: the dielectric constant of HfO₂ is 4–6 times higher than that of SiO₂. The dielectric constant and other properties depend on the deposition method, composition and microstructure of the material. Hafnium oxide (as well as doped and oxygen-deficient hafnium oxide) attracts additional interest as a possible candidate for resistive-switching memories and CMOS-compatible ferroelectric field effect transistors ( FeFET memory) and memory chips. Because of its very high melting point, hafnia is also used as a refractory material in the insulation of such devices as

thermocouple A thermocouple, also known as a "thermoelectrical thermometer", is an electrical device consisting of two dissimilar electrical conductors forming an electrical junction. A thermocouple produces a temperature-dependent voltage as a result of the ...

s, where it can operate at temperatures up to 2500 °C. Multilayered films of hafnium dioxide, silica, and other materials have been developed for use in

passive cooling Passive cooling is a building design approach that focuses on heat gain control and heat dissipation in a building in order to improve the indoor thermal comfort with low or no energy consumption. This approach works either by preventing heat from ...

of buildings. The films reflect sunlight and radiate heat at wavelengths that pass through Earth's atmosphere, and can have temperatures several degrees cooler than surrounding materials under the same conditions.

References

{{oxygen compounds Hafnium compounds High-κ dielectrics Transition metal oxides Ferroelectric materials