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Trichlorosilane
Trichlorosilane is an inorganic compound with the formula HCl3Si. It is a colourless, volatile liquid. Purified trichlorosilane is the principal precursor to ultrapure silicon in the semiconductor industry. In water, it rapidly decomposes to produce a siloxane polymer while giving off hydrochloric acid. Because of its reactivity and wide availability, it is frequently used in the synthesis of silicon-containing organic compounds. Production Trichlorosilane is produced by treating powdered metallurgical grade silicon with blowing hydrogen chloride at 300 °C. Hydrogen is also produced, as described in the chemical equation: :Si + 3 HCl → HCl3Si + H2 Yields of 80-90% can be achieved. The main byproducts are silicon tetrachloride (chemical formula SiCl4), hexachlorodisilane (Si2Cl6) and dichlorosilane (H2SiCl2), from which trichlorosilane can be separated by distillation. It is also produced from silicon tetrachloride: :Si + 3 SiCl4 + 2 H2 → 4 HCl3Si Application ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Octadecyltrichlorosilane
Octadecyltrichlorosilane (ODTS or ''n''-octadecyltrichlorosilane) is an organosilicon chemical. It is used in semiconductor industry to form self-assembled monolayer thin films on silicon dioxide substrates. Its structural chemical formula is CH3(CH2)17SiCl3. It is flammable, reacts with water, and is also sensitive to air. It is corrosive and can severely damage mucous membranes. Its EINECS number is 203-930-7. Octadecyltrichlorosilane is an amphiphilic molecule consisting of a long-chain alkyl group (C18H37–) and a polar head group (SiCl3–), which forms self assembled monolayers (SAMs) on various oxidic substrates. ODTS finds its use in molecular electronics, as thin insulating gates in metal-insulator-semiconductor field-effect transistors. Dodecyltrichlorosilane, an ODTS analog with shorter alkyl chain, is used for the same purpose as well. ODTS-poly-4-vinylphenol, PVP films are used in organic-substrate LCD displays. References {{reflist Chlorosilanes Thi ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Perfluorodecyltrichlorosilane
Perfluorodecyltrichlorosilane, also known as FDTS, is a colorless liquid chemical with molecular formula C10 H4 Cl3 F17 Si. FDTS molecules form self-assembled monolayers. They form covalent silicon–oxygen bonds to free hydroxyl (–OH) groups, such as the surfaces of glass, ceramics, or silica. Due to its heavily fluorinated tail group, a FDTS monolayer reduces surface energy. Deposition of a FDTS monolayer is achieved by a relatively simple process, also known as molecular vapor deposition (MVD) It usually deposits from a vapor phase, at room to near-to-room temperatures (50 °C) and is thus compatible with most substrates. The process is usually carried out in a vacuum chamber and assisted by the presence of water vapor. Treated surfaces have water repellent and friction reducing properties. For this reason, a FDTS monolayer is often applied to movable microparts of microelectromechanical systems (MEMS). A FDTS monolayer reduces surface energy and prevents sticking, so ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Chlorosilane
Chlorosilanes are a group of reactive, chlorine-containing chemical compounds, related to silane and used in many chemical processes. Each such chemical has at least one silicon-chlorine bond. Trichlorosilane is produced on the largest scale. The parent chlorosilane is silicon tetrachloride ().. Synthesis Hydrochlorosilanes They are prepared by the Müller-Rochow process, which involves treating silicon with hydrogen chloride at elevated temperatures in the presence of a copper catalyst. The idealized equation is :2 Si + 6 HCl → 2 HSiCl3 + 2 H2, Trichlorosilane (HSiCl3) is the main product; dichlorosilane (H2SiCl2) and silicon tetrachloride (SiCl4) are obtained as byproducts. The process was independently discovered by Eugene G. Rochow and Richard Müller in 1940. Methylchlorosilanes Methyltrichlorosilane (CH3SiCl3), dimethyldichlorosilane ((CH3)2SiCl2), and trimethylsilyl chloride ((CH3)3SiCl) are produced by the direct process. They are key reagents in organosilicon chemistr ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Metallurgical Grade Silicon
Silicon is a chemical element with the symbol Si and atomic number 14. It is a hard, brittle crystalline solid with a blue-grey metallic luster, and is a tetravalent metalloid and semiconductor. It is a member of group 14 in the periodic table: carbon is above it; and germanium, tin, lead, and flerovium are below it. It is relatively unreactive. Because of its high chemical affinity for oxygen, it was not until 1823 that Jöns Jakob Berzelius was first able to prepare it and characterize it in pure form. Its oxides form a family of anions known as silicates. Its melting and boiling points of 1414 °C and 3265 °C, respectively, are the second highest among all the metalloids and nonmetals, being surpassed only by boron. Silicon is the eighth most common element in the universe by mass, but very rarely occurs as the pure element in the Earth's crust. It is widely distributed in space in cosmic dusts, planetoids, and planets as various forms of silicon dioxide (silica ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Self-assembled Monolayer
Self-assembled monolayers (SAM) of organic molecules are molecular assemblies formed spontaneously on surfaces by adsorption and are organized into more or less large ordered domains. In some cases molecules that form the monolayer do not interact strongly with the substrate. This is the case for instance of the two-dimensional supramolecular networks of e.g. perylenetetracarboxylic dianhydride (PTCDA) on gold or of e.g. porphyrins on HOPG, highly oriented pyrolitic graphite (HOPG). In other cases the molecules possess a head group that has a strong affinity to the substrate and anchors the molecule to it. Such a SAM consisting of a head group, tail and functional end group is depicted in Figure 1. Common head groups include thiols, silanes, phosphonates, etc. SAMs are created by the chemisorption of "head groups" onto a substrate from either the vapor or liquid phase followed by a slow organization of "tail groups". Initially, at small molecular density on the surface, adsorbat ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Hydrosilylation
Hydrosilylation, also called catalytic hydrosilation, describes the addition of Si-H bonds across unsaturated bonds."Hydrosilylation A Comprehensive Review on Recent Advances" B. Marciniec (ed.), Advances in Silicon Science, Springer Science, 2009. Ordinarily the reaction is conducted catalytically and usually the substrates are unsaturated organic compounds. Alkenes and alkynes give alkyl and vinyl silanes; aldehydes and ketones give silyl ethers. Hydrosilylation has been called the "most important application of platinum in homogeneous catalysis." Scope and mechanism Hydrosilylation of alkenes represents a commercially important method for preparing organosilicon compounds. The process is mechanistically similar to the hydrogenation of alkenes. In fact, similar catalysts are sometimes employed for the two catalytic processes. The prevalent mechanism, called the Chalk-Harrod mechanism, assumes an intermediate metal complex that contains a hydride, a silyl ligand (R3Si), and ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Dichlorosilane
Dichlorosilane, or DCS as it is commonly known, is a chemical compound with the formula H2SiCl2. In its major use, it is mixed with ammonia (NH3) in LPCVD chambers to grow silicon nitride in semiconductor processing. A higher concentration of DCS·NH3 (i.e. 16:1), usually results in lower stress nitride films. History Dichlorosilane was originally prepared in 1919 by the gas-phase reaction of monosilane, SiH4, with hydrogen chloride, HCl, and then reported by Stock and Somieski. It was found that in the gas phase, dichlorosilane will react with water vapor to give a gaseous monomeric prosiloxane, H2SiO. Prosiloxane polymerizes rapidly in the liquid phase and slowly in the gas phase, which results in liquid and solid polysiloxanes 2SiOsub>n. The liquid portion of the product, which is collected via vacuum distillation, becomes viscous and gelled at room temperature. Hydrolysis was done on a solution of H2SiCl2 in benzene by brief contact with water, and the molecular weight was ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Silicon Tetrachloride
Silicon tetrachloride or tetrachlorosilane is the inorganic compound with the formula SiCl4. It is a colourless volatile liquid that fumes in air. It is used to produce high purity silicon and silica for commercial applications. Preparation Silicon tetrachloride is prepared by the chlorination of various silicon compounds such as ferrosilicon, silicon carbide, or mixtures of silicon dioxide and carbon. The ferrosilicon route is most common. In the laboratory, can be prepared by treating silicon with chlorine at : : It was first prepared by Jöns Jakob Berzelius in 1823. Brine can be contaminated with silica when the production of chlorine is a byproduct of a metal refining process from metal chloride ore. In rare occurrences, the silicon dioxide in silica is converted to silicon tetrachloride when the contaminated brine is electrolyzed. Reactions Hydrolysis and related reactions Like other chlorosilanes, silicon tetrachloride reacts readily with water: :SiCl4 + 2 H2O → SiO ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Dichlorosilane
Dichlorosilane, or DCS as it is commonly known, is a chemical compound with the formula H2SiCl2. In its major use, it is mixed with ammonia (NH3) in LPCVD chambers to grow silicon nitride in semiconductor processing. A higher concentration of DCS·NH3 (i.e. 16:1), usually results in lower stress nitride films. History Dichlorosilane was originally prepared in 1919 by the gas-phase reaction of monosilane, SiH4, with hydrogen chloride, HCl, and then reported by Stock and Somieski. It was found that in the gas phase, dichlorosilane will react with water vapor to give a gaseous monomeric prosiloxane, H2SiO. Prosiloxane polymerizes rapidly in the liquid phase and slowly in the gas phase, which results in liquid and solid polysiloxanes 2SiOsub>n. The liquid portion of the product, which is collected via vacuum distillation, becomes viscous and gelled at room temperature. Hydrolysis was done on a solution of H2SiCl2 in benzene by brief contact with water, and the molecular weight was ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Silicon Tetrachloride
Silicon tetrachloride or tetrachlorosilane is the inorganic compound with the formula SiCl4. It is a colourless volatile liquid that fumes in air. It is used to produce high purity silicon and silica for commercial applications. Preparation Silicon tetrachloride is prepared by the chlorination of various silicon compounds such as ferrosilicon, silicon carbide, or mixtures of silicon dioxide and carbon. The ferrosilicon route is most common. In the laboratory, can be prepared by treating silicon with chlorine at : : It was first prepared by Jöns Jakob Berzelius in 1823. Brine can be contaminated with silica when the production of chlorine is a byproduct of a metal refining process from metal chloride ore. In rare occurrences, the silicon dioxide in silica is converted to silicon tetrachloride when the contaminated brine is electrolyzed. Reactions Hydrolysis and related reactions Like other chlorosilanes, silicon tetrachloride reacts readily with water: :SiCl4 + 2 H2O → SiO ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Tribromosilane
Tribromosilane is the chemical compound with the formula Br3Si. At high temperatures, it decomposes to produce silicon, and is an alternative to purified trichlorosilane of ultrapure silicon in the semiconductor industry. The Schumacher Process of silicon deposition uses tribromosilane gas to produce polysilicon, but it has a number of cost and safety advantages over the Siemens Process to make polysilicon. It may be prepared by heating crystalline silicon with gaseous hydrogen bromide Hydrogen bromide is the inorganic compound with the formula . It is a hydrogen halide consisting of hydrogen and bromine. A colorless gas, it dissolves in water, forming hydrobromic acid, which is saturated at 68.85% HBr by weight at room temper ... at high temperature. It spontaneously combusts when exposed to air. References {{inorganic-compound-stub Silanes Bromides Nonmetal halides ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
MEMS
Microelectromechanical systems (MEMS), also written as micro-electro-mechanical systems (or microelectronic and microelectromechanical systems) and the related micromechatronics and microsystems constitute the technology of microscopic devices, particularly those with moving parts. They merge at the nanoscale into nanoelectromechanical systems (NEMS) and nanotechnology. MEMS are also referred to as micromachines in Japan and microsystem technology (MST) in Europe. MEMS are made up of components between 1 and 100 micrometers in size (i.e., 0.001 to 0.1 mm), and MEMS devices generally range in size from 20 micrometres to a millimetre (i.e., 0.02 to 1.0 mm), although components arranged in arrays (e.g., digital micromirror devices) can be more than 1000 mm2. They usually consist of a central unit that processes data (an integrated circuit chip such as microprocessor) and several components that interact with the surroundings (such as microsensors). Because of the la ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
