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Remote Plasma
A remote plasma (also downstream plasma or afterglow plasma) is a plasma processing method in which the plasma and material interaction occurs at a location remote from the plasma in the plasma afterglow. See also *Chemical vapor deposition *Corona treatment *List of plasma (physics) applications articles *Physical vapor deposition *Plasma activation *Plasma chemistry *Plasma cleaning *Plasma-activated bonding *Reactive ion etching References Plasma processing Semiconductor device fabrication {{Materials-sci-stub ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Plasma Processing
Plasma processing is a plasma-based material processing technology that aims at modifying the chemical and physical properties of a surface. Plasma processing techniques include: *Plasma activation *Plasma ashing *Plasma cleaning *Plasma electrolytic oxidation *Plasma etching *Plasma functionalization *Plasma polymerization *Corona treatment *Plasma modification Related topics are plasma chemistry, chemical vapor deposition, and physical vapor deposition processes like sputter deposition, plasma iondoping, vacuum plasmaspraying, and reactive ion etching. See also *List of plasma (physics) applications articles This is a list of plasma physics topics. A * Ablation * Abradable coating * Abraham–Lorentz force * Absorption band * Accretion disk * Active galactic nucleus * Adiabatic invariant * ADITYA (tokamak) * Aeronomy * Afterglow plasma * A ... References {{reflist ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Plasma Afterglow
A plasma afterglow (also afterglow) is the radiation emitted from a plasma after the source of ionization is removed. The external electromagnetic fields that sustained the plasma glow are absent or insufficient to maintain the discharge in the afterglow. A plasma afterglow can either be a temporal, due to an interrupted (pulsed) plasma source, or spatial, due to a distant plasma source. In the afterglow, plasma-generated species de-excite and participate in secondary chemical reactions that tend to form stable species. Depending on the gas composition, super-elastic collisions may continue to sustain the plasma in the afterglow for a while by releasing the energy stored in rovibronic degrees of freedom of the atoms and molecules of the plasma. Especially in molecular gases, the plasma chemistry in the afterglow is significantly different from the plasma glow. The afterglow of a plasma is still a plasma and as thus retains most of the properties of a plasma. History The firs ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Cambridge University Press
Cambridge University Press is the university press of the University of Cambridge. Granted letters patent by Henry VIII of England, King Henry VIII in 1534, it is the oldest university press A university press is an academic publishing house specializing in monographs and scholarly journals. Most are nonprofit organizations and an integral component of a large research university. They publish work that has been reviewed by schola ... in the world. It is also the King's Printer. Cambridge University Press is a department of the University of Cambridge and is both an academic and educational publisher. It became part of Cambridge University Press & Assessment, following a merger with Cambridge Assessment in 2021. With a global sales presence, publishing hubs, and offices in more than 40 Country, countries, it publishes over 50,000 titles by authors from over 100 countries. Its publishing includes more than 380 academic journals, monographs, reference works, school and uni ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Chemical Vapor Deposition
Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber. Microfabrication processes widely use CVD to deposit materials in various forms, including: monocrystalline, polycrystalline, amorphous, and epitaxial. These materials include: silicon ( dioxide, carbide, nitride, oxynitride), carbon (fiber, nanofibers, nanotubes, diamond and graphene), fluorocarbons, filaments, tungsten, titanium nitride and various high-κ dielectrics. The term ''chemical vapour deposition'' was coined 1960 by ''John M. Blocher, Jr.'' who intended to differentiate ''chemic ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Corona Treatment
Corona treatment (sometimes referred to as air plasma) is a surface modification technique that uses a low temperature corona discharge plasma to impart changes in the properties of a surface. The corona plasma is generated by the application of high voltage to an electrode that has a sharp tip. The plasma forms at the tip. A linear array of electrodes is often used to create a curtain of corona plasma. Materials such as plastics, cloth, or paper may be passed through the corona plasma curtain in order to change the surface energy of the material. All materials have an inherent surface energy. Surface treatment systems are available for virtually any surface format including dimensional objects, sheets and roll goods that are handled in a web format. Corona treatment is a widely used surface treatment method in the plastic film, extrusion, and converting industries. History The corona treatment was invented by the Danish engineer Verner Eisby in 1951. Eisby had been asked by ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
List Of Plasma (physics) Applications Articles
This is a list of plasma physics topics. A * Ablation * Abradable coating * Abraham–Lorentz force * Absorption band * Accretion disk * Active galactic nucleus * Adiabatic invariant * ADITYA (tokamak) * Aeronomy * Afterglow plasma * Airglow * Air plasma, Corona treatment, Atmospheric-pressure plasma treatment * Ayaks, Novel "Magneto-plasmo-chemical engine" * Alcator C-Mod * Alfvén wave * Ambipolar diffusion * Aneutronic fusion * Anisothermal plasma * Anisotropy * Antiproton Decelerator * Appleton-Hartree equation * Arcing horns * Arc lamp * Arc suppression * ASDEX Upgrade, Axially Symmetric Divertor EXperiment * Astron (fusion reactor) * Astronomy * Astrophysical plasma * Astrophysical X-ray source * Atmospheric dynamo * Atmospheric escape * Atmospheric pressure discharge * Atmospheric-pressure plasma * Atom * Atomic emission spectroscopy * Atomic physics * Atomic-terrace low-angle shadowing * Auger electron spectroscopy * Aurora (astronomy) B * Babcock ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Physical Vapor Deposition
Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a vapor phase and then back to a thin film condensed phase. The most common PVD processes are sputtering and evaporation. PVD is used in the manufacturing of items which require thin films for optical, mechanical, electrical, acoustic or chemical functions. Examples include semiconductor devices such as thin-film solar cells, microelectromechanical devices such as thin film bulk acoustic resonator, aluminized PET film for food packaging and balloons, and titanium nitride coated cutting tools for metalworking. Besides PVD tools for fabrication, special smaller tools used mainly for scientific purposes have been developed. The source material i ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Plasma Activation
Plasma activation (or plasma functionalization) is a method of surface modification employing plasma processing, which improves surface adhesion properties of many materials including metals, glass, ceramics, a broad range of polymers and textiles and even natural materials such as wood and seeds. Plasma functionalization also refers to the introduction of functional groups on the surface of exposed materials. It is widely used in industrial processes to prepare surfaces for bonding, gluing, coating and painting. Plasma processing achieves this effect through a combination of reduction of metal oxides, ultra-fine surface cleaning from organic contaminants, modification of the surface topography and deposition of functional chemical groups. Importantly, the plasma activation can be performed at atmospheric pressure using air or typical industrial gases including hydrogen, nitrogen and oxygen. Thus, the surface functionalization is achieved without expensive vacuum equipment or wet ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Plasma Chemistry
Gas phase ion chemistry is a field of science encompassed within both chemistry and physics. It is the science that studies ions and molecules in the gas phase, most often enabled by some form of mass spectrometry. By far the most important applications for this science is in studying the thermodynamics and chemical kinetics, kinetics of reactions. For example, one application is in studying the thermodynamics of the solvation of ions. Ions with small solvation spheres of 1, 2, 3... solvent molecules can be studied in the gas phase and then extrapolated to bulk solution. Theory Transition state theory Transition state theory is the theory of the rates of elementary reactions which assumes a special type of chemical equilibrium (quasi-equilibrium) between reactants and activated complexes. RRKM theory RRKM theory is used to compute simple estimates of the unimolecular ion decomposition reaction rates from a few characteristics of the potential energy surface. Gas phase ion form ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Plasma Cleaning
Plasma cleaning is the removal of impurities and contaminants from surfaces through the use of an energetic plasma or dielectric barrier discharge (DBD) plasma created from gaseous species. Gases such as argon and oxygen, as well as mixtures such as air and hydrogen/nitrogen are used. The plasma is created by using high frequency voltages (typically kHz to >MHz) to ionise the low pressure gas (typically around 1/1000 atmospheric pressure), although atmospheric pressure plasmas are now also common. Methods In plasma, gas atoms are excited to higher energy states and also ionized. As the atoms and molecules 'relax' to their normal, lower energy states they release a photon of light, this results in the characteristic “glow” or light associated with plasma. Different gases give different colors. For example, oxygen plasma emits a light blue color. A plasma’s activated species include atoms, molecules, ions, electrons, free radicals, metastables, and photons in the short wave u ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Plasma-activated Bonding
Plasma-activated bonding is a derivative, directed to lower processing temperatures for direct bonding with hydrophilic surfaces. The main requirements for lowering temperatures of direct bonding are the use of materials melting at low temperatures and with different coefficients of thermal expansion (CTE). Surface activation prior to bonding has the typical advantage that no intermediate layer is needed and sufficiently high bonding energy is achieved after annealing at temperatures below 400 °C. Overview The decrease of temperature is based on the increase of bonding strength using plasma activation on clean wafer surfaces. Further, the increase is caused by elevation in amount of Si-OH groups, removal of contaminants on the wafer surface, the enhancement of viscous flow of the surface layer and the enhanced diffusivity of water and gas trapped at the interface. Based on ambient pressure, two main surface activation fields using plasma treatment are established f ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
