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Negative Resist
A photoresist (also known simply as a resist) is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronic industry. The process begins by coating a substrate with a light-sensitive organic material. A patterned mask is then applied to the surface to block light, so that only unmasked regions of the material will be exposed to light. A solvent, called a developer, is then applied to the surface. In the case of a positive photoresist, the photo-sensitive material is degraded by light and the developer will dissolve away the regions that were exposed to light, leaving behind a coating where the mask was placed. In the case of a negative photoresist, the photosensitive material is strengthened (either polymerized or cross-linked) by light, and the developer will dissolve away only the regions that were not exposed to light, leaving behind a coating in areas ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Sensitometry
Sensitometry is the scientific study of light-sensitive materials, especially photographic film. The study has its origins in the work by Ferdinand Hurter and Vero Charles Driffield (circa 1876) with early black-and-white emulsions. They determined how the density of silver produced varied with the amount of light received, and the method and time of development. Details Plots of film density (log of opacity) versus the log of exposure are called characteristic curves, Hurter–Driffield curves, H–D curves, HD curves, H & D curves, D–logE curves, or D–logH curves. At moderate exposures, the overall shape is typically a bit like an "S" slanted so that its base and top are horizontal. There is usually a central region of the HD curve which approximates to a straight line, called the "linear" or "straight-line" portion; the slope of this region is called the gamma. The low end is called the "toe", and at the top, the curve rounds over to form the "shoulder". At extremely hi ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Self-assembly
Self-assembly is a process in which a disordered system of pre-existing components forms an organized structure or pattern as a consequence of specific, local interactions among the components themselves, without external direction. When the constitutive components are molecules, the process is termed molecular self-assembly. Self-assembly can be classified as either static or dynamic. In ''static'' self-assembly, the ordered state forms as a system approaches equilibrium, reducing its free energy. However, in ''dynamic'' self-assembly, patterns of pre-existing components organized by specific local interactions are not commonly described as "self-assembled" by scientists in the associated disciplines. These structures are better described as "self-organized", although these terms are often used interchangeably. Self-assembly in chemistry and materials science Self-assembly in the classic sense can be defined as ''the spontaneous and reversible organization of molec ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Polydimethylsiloxane
Polydimethylsiloxane (PDMS), also known as dimethylpolysiloxane or dimethicone, belongs to a group of polymeric organosilicon compounds that are commonly referred to as silicones. PDMS is the most widely used silicon-based organic polymer, as its versatility and properties lead to many applications. It is particularly known for its unusual rheological (or flow) properties. PDMS is optically clear and, in general, inert, non-toxic, and non-flammable. It is one of several types of silicone oil (polymerized siloxane). Its applications range from contact lenses and medical devices to elastomers; it is also present in shampoos (as it makes hair shiny and slippery), food (antifoaming agent), caulk, lubricants and heat-resistant tiles. Structure The chemical formula of PDMS is , where ''n'' is the number of repeating monomer units.Mark, J. E.; Allcock, H. R.; West, R. “Inorganic Polymers” Prentice Hall, Englewood, NJ: 1992. . Industrial synthesis can begin from dimethyldichloro ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Inking And Contact Process
{{disambiguation ...
Inking may refer to: * Inking (attack), act of throwing ink on other person *Inking, a defensive activity of certain cephalopods and sea hares * Inking (comic book production) * Pen computing, a computer input method using a stylus *A real-time computer graphics technique of outlining the edges of a model See also *Ink (other) Ink is a liquid containing pigments or dyes used for drawing, writing or printing. Ink may also refer to: Places * Ink, Arkansas, United States * Ink, Missouri, United States Arts, entertainment, and media Fictional characters * Ink (comic ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Creating The PDMS Master
Creation may refer to: Religion *''Creatio ex nihilo'', the concept that matter was created by God out of nothing *Creation myth, a religious story of the origin of the world and how people first came to inhabit it *Creationism, the belief that the universe was created in specific divine acts and the social movement affiliated with it *Creator deity, a deity responsible for the creation of everything that exists *Genesis creation narrative, the biblical account of creation *Creation Museum, a creationist museum in Kentucky *Creation Ministries International, a Christian apologetics organization *Creation Festival, two annual four-day Christian music festivals held in the United States Entertainment Music Albums * ''Creation'' (EP), 2016 EP by Seven Lions * ''Creation'' (John Coltrane album), 1965 * ''Creation'' (Branford Marsalis album), 2001 * ''Creation'' (Keith Jarrett album), 2015 * ''Creation'' (Archie Roach album), 2013 * ''Creation'' (The Pierces album), 2014 *''Creation'' ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Electron-beam Lithography
Electron-beam lithography (often abbreviated as e-beam lithography, EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). The electron beam changes the solubility of the resist, enabling selective removal of either the exposed or non-exposed regions of the resist by immersing it in a solvent (developing). The purpose, as with photolithography, is to create very small structures in the resist that can subsequently be transferred to the substrate material, often by etching. The primary advantage of electron-beam lithography is that it can draw custom patterns (direct-write) with sub-10 nm resolution. This form of maskless lithography has high resolution and low throughput, limiting its usage to photomask fabrication, low-volume production of semiconductor devices, and research and development. Systems Electron-beam lithography systems used in commercial applicatio ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Hydrogen Silsesquioxane
200px, thumbnail, Hydrogen silsesquioxane (R = H). Hydrogen silsesquioxane(s) (HSQ, H-SiOx, THn, H-resin) are inorganic compounds with the empirical formula SiO3/2sub>n. The cubic H8Si8O12 (TH8) is used as the visual representation for HSQ. TH8, TH10, TH12, and TH14 have been characterized by EA), gas chromatography–mass spectroscopy ( GC-MS), IR spectroscopy, and NMR spectroscopy . High purity semiconductor-grade HSQ has been investigated as a negative resist in photolithography and electron-beam (e-beam) lithography. HSQ is commonly delivered in methyl isobutyl ketone ( MIBK) and can be used to form 0.01–2 µm films on substrates/wafers. When exposed to electrons or extreme ultraviolet radiation (EUV), HSQ cross-links via hydrogen evolution concomitant with Si-O bond crosslink In chemistry and biology a cross-link is a bond or a short sequence of bonds that links one polymer chain to another. These links may take the form of covalent bonds or ionic bonds an ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
KTH Royal Institute Of Technology
The KTH Royal Institute of Technology ( sv, Kungliga Tekniska högskolan, lit=Royal Institute of Technology), abbreviated KTH, is a public research university in Stockholm, Sweden. KTH conducts research and education in engineering and technology and is Sweden's largest technical university. Currently, KTH consists of five schools with four campuses in and around Stockholm. KTH was established in 1827 as the ''Teknologiska institutet (Institute of Technology)'' and had its roots in the ''Mekaniska skolan (School of Mechanics)'' that was established in 1798 in Stockholm. But the origin of KTH dates back to the predecessor of the ''Mekaniska skolan'', the ''Laboratorium mechanicum'', which was established in 1697 by the Swedish scientist and innovator Christopher Polhem. The Laboratorium mechanicum combined education technology, a laboratory, and an exhibition space for innovations. In 1877 KTH received its current name, Kungliga Tekniska högskolan (KTH Royal Institute of Technol ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
SU-8 Photoresist
SU-8 is a commonly used epoxy-based negative photoresist. Negative refers to a photoresist whereby the parts exposed to UV become cross-linked, while the remainder of the film remains soluble and can be washed away during development. As shown in the structural diagram, SU-8 derives its name from the presence of 8 epoxy groups. This is a statistical average per moiety. It is these epoxies that cross-link to give the final structure. It can be made into a viscous polymer that can be spun or spread over a thickness ranging from below 1 micrometer up to above 300 micrometers, or Thick Film Dry Sheets (TFDS) for lamination up to above 1 millimetre thick. Up to 500 µm the resist can be processed with standard contact lithography. Above 500 µm absorption leads to increasing sidewall undercuts and poor curing at the substrate interface. It can be used to pattern high aspect ratio structures. An aspect ratio of (> 20) has been achieved with the solution formulation a ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Tetramethylammonium Hydroxide
Tetramethylammonium hydroxide (TMAH or TMAOH) is a quaternary ammonium salt with molecular formula N(CH3)4+ OH−. It is commonly encountered in form of concentrated solutions in water or methanol. TMAH in solid state and its aqueous solutions are all colorless, but may be yellowish if impure. Although TMAH has virtually no odor when pure, samples often have a strong fishy smell due to presence of trimethylamine which is a common impurity. TMAH has several diverse industrial and research applications. Chemical properties Structure TMAH is most commonly encountered as an aqueous solution, in concentrations from ~2–25%, and less frequently as solutions in methanol. These solutions are identified by CAS numbe75-59-2 Several hydrates such as N(CH3)4OH·xH2O. have been crystallized. These salts contain well separated Me4N+ cations and hydroxide anions ( Me is an abbreviation of methyl group). The hydroxide groups are linked by hydrogen bonds to the water of crystallization ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Novolac
Novolaks (sometimes: novolacs) are low molecular weight polymers derived from phenols and formaldehyde. They are related to Bakelite, which is more highly crosslinked. The term comes from Swedish "lack" for lacquer and Latin "novo" for new, since these materials were envisioned to replace natural lacquers such as copal, copal resin. Typically novolaks are prepared by the condensation of phenol or a mixture of p- and m-cresol with formaldehyde (as formalin). The reaction is acid catalyzed. Oxalic acid is often used because it can be subsequently removed by thermal decomposition. Novolaks have a degree of polymerization of approximately 20-40. The branching density, determined by the processing conditions, m- vs p-cresol ratio, as well as CH2O/cresol ratio is typically around 15%. Novolaks are especially important in microelectronics where they are used as photoresist materials. They are also used as tackifiers in rubber. See also * Epoxy References {{reflist Phenol form ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Valence Band
In solid-state physics, the valence band and conduction band are the bands closest to the Fermi level, and thus determine the electrical conductivity of the solid. In nonmetals, the valence band is the highest range of electron energies in which electrons are normally present at absolute zero temperature, while the conduction band is the lowest range of vacant electronic states. On a graph of the electronic band structure of a material, the valence band is located below the Fermi level, while the conduction band is located above it. The distinction between the valence and conduction bands is meaningless in metals, because conduction occurs in one or more partially filled bands that take on the properties of both the valence and conduction bands. Band gap In semiconductors and insulators the two bands are separated by a band gap, while in semimetals the bands overlap. A band gap is an energy range in a solid where no electron states can exist due to the quantization of ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
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