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Transformer Coupled Plasma
An inductively coupled plasma (ICP) or transformer coupled plasma (TCP) is a type of plasma source in which the energy is supplied by electric currents which are produced by electromagnetic induction, that is, by time-varying magnetic fields. Operation There are three types of ICP geometries: planar (Fig. 3 (a)), cylindrical (Fig. 3 (b)), and half-toroidal (Fig. 3 (c)). In planar geometry, the electrode is a length of flat metal wound like a spiral (or coil). In cylindrical geometry, it is like a helical spring. In half-toroidal geometry, it is toroidal solenoid cut along its main diameter to two equal halves. When a time-varying electric current is passed through the coil, it creates a time-varying magnetic field around it, with flux \Phi=\pi r^2 H=\pi r^2 H_0 \cos \omega t, where ''r'' is the distance to the center of coil (and of the quartz tube). According to the Faraday–Lenz's law of induction, this creates azimuthal electromotive force in the rarefied gas: U=-\fra ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Inductively Coupled Plasma
An inductively coupled plasma (ICP) or transformer coupled plasma (TCP) is a type of plasma source in which the energy is supplied by electric currents which are produced by electromagnetic induction, that is, by time-varying magnetic fields. Operation There are three types of ICP geometries: planar (Fig. 3 (a)), cylindrical (Fig. 3 (b)), and half-toroidal (Fig. 3 (c)). In planar geometry, the electrode is a length of flat metal wound like a spiral (or coil). In cylindrical geometry, it is like a helical spring. In half-toroidal geometry, it is toroidal solenoid cut along its main diameter to two equal halves. When a time-varying electric current is passed through the coil, it creates a time-varying magnetic field around it, with flux \Phi=\pi r^2 H=\pi r^2 H_0 \cos \omega t, where ''r'' is the distance to the center of coil (and of the quartz tube). According to the Faraday–Lenz's law of induction, this creates azimuthal electromotive force in the rarefied gas: U ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Ionization Energies Of The Elements
These tables list values of molar ionization energies, measured in kJ⋅mol−1. This is the energy per mole necessary to remove electrons from gaseous atoms or atomic ions. The first molar ionization energy applies to the neutral atoms. The second, third, etc., molar ionization energy applies to the further removal of an electron from a singly, doubly, etc., charged ion. For ionization energies measured in the unit eV, see ''Ionization energies of the elements (data page)''. All data from rutherfordium onwards is predicted. 1st–10th ionisation energies 11th–20th ionisation energies 21st–30th ionisation energies References * Ionization energies of the elements (data page) Numerical values For each atom, the column marked 1 is the first ionization energy to ionize the neutral atom, the column marked 2 is the second ionization energy to remove a second electron from the +1 ion, the column marked 3 is the third io ... * (for predictions) * * ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Pulsed Inductive Thruster
A pulsed inductive thruster (PIT) is a form of ion thruster, used in spacecraft propulsion. It is a plasma propulsion engine using perpendicular electric and magnetic fields to accelerate a propellant with no electrode. Operation A nozzle releases a puff of gas which spreads across a flat spiraling induction coil of wire about 1 meter across. A bank of capacitors releases a pulse of high voltage electric current of tens of kilovolts lasting 10 microseconds into the coil, generating a radial magnetic field. This induces a circular electrical field in the gas, ionizing it and causing charged particles (free electrons and ions) to revolve in the opposite direction as the original pulse of current. Because the motion of this induced current flow is perpendicular to the magnetic field, the plasma is accelerated out into space by the Lorentz force at a high exhaust velocity (10 to 100 km/s). Advantages Unlike an electrostatic ion thruster which uses an electric field ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
List Of Plasma Physics Articles
This is a list of plasma physics topics. A * Ablation * Abradable coating * Abraham–Lorentz force * Absorption band * Accretion disk * Active galactic nucleus * Adiabatic invariant * ADITYA (tokamak) * Aeronomy * Afterglow plasma * Airglow * Air plasma, Corona treatment, Atmospheric-pressure plasma treatment * Ayaks, Novel "Magneto-plasmo-chemical engine" * Alcator C-Mod * Alfvén wave * Ambipolar diffusion * Aneutronic fusion * Anisothermal plasma * Anisotropy * Antiproton Decelerator * Appleton-Hartree equation * Arcing horns * Arc lamp * Arc suppression * ASDEX Upgrade, Axially Symmetric Divertor EXperiment * Astron (fusion reactor) * Astronomy * Astrophysical plasma * Astrophysical X-ray source * Atmospheric dynamo * Atmospheric escape * Atmospheric pressure discharge * Atmospheric-pressure plasma * Atom * Atomic emission spectroscopy * Atomic physics * Atomic-terrace low-angle shadowing * Auger electron spectroscopy * Aurora (astronomy) B * Babcock Model * ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Induction Plasma Technology
Induction plasma, also called inductively coupled plasma, is a type of high temperature plasma generated by electromagnetic induction, usually coupled with argon gas. The magnetic field induces an electric current within the gas which creates the plasma. The plasma can reach temperatures up to 10,000 Kelvin. Inductive plasma technology is used in fields such as powder spheroidisation and nano-material synthesis. The technology is applied via an Induction plasma torch, which consists of three basic elements: the induction coil, a confinement chamber, and a torch head, or gas distributor. The main benefit of this technology is the elimination of electrodes, which can deteriorate and introduce contamination. History The 1960s were the incipient period of thermal plasma technology, spurred by the needs of aerospace programs. Among the various methods of thermal plasma generation, induction plasma (or inductively coupled plasma) takes up an important role. Early attempts to maintain ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Capacitively Coupled Plasma
A capacitively coupled plasma (CCP) is one of the most common types of industrial plasma sources. It essentially consists of two metal electrodes separated by a small distance, placed in a reactor. The gas pressure in the reactor can be lower than atmosphere or it can be atmospheric. Description A typical CCP system is driven by a single radio-frequency (RF) power supply, typically at 13.56 MHz.UK Wireless Telegraphy (Short Range Devices) (Exemption) Regulations 199/ref> One of two electrodes is connected to the power supply, and the other one is ground (electricity), grounded. As this configuration is similar in principle to a capacitor in an electric circuit, the plasma formed in this configuration is called a capacitively coupled plasma. When an electric field is generated between electrodes, atoms are ionized and release electrons. The electrons in the gas are accelerated by the RF field and can ionize the gas directly or indirectly by collisions, producing second ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Capacitively Coupled Plasma
A capacitively coupled plasma (CCP) is one of the most common types of industrial plasma sources. It essentially consists of two metal electrodes separated by a small distance, placed in a reactor. The gas pressure in the reactor can be lower than atmosphere or it can be atmospheric. Description A typical CCP system is driven by a single radio-frequency (RF) power supply, typically at 13.56 MHz.UK Wireless Telegraphy (Short Range Devices) (Exemption) Regulations 199/ref> One of two electrodes is connected to the power supply, and the other one is ground (electricity), grounded. As this configuration is similar in principle to a capacitor in an electric circuit, the plasma formed in this configuration is called a capacitively coupled plasma. When an electric field is generated between electrodes, atoms are ionized and release electrons. The electrons in the gas are accelerated by the RF field and can ionize the gas directly or indirectly by collisions, producing second ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Reactive-ion Etching
Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it. Equipment A typical (parallel plate) RIE system consists of a cylindrical vacuum chamber, with a wafer platter situated in the bottom portion of the chamber. The wafer platter is electrically isolated from the rest of the chamber. Gas enters through small inlets in the top of the chamber, and exits to the vacuum pump system through the bottom. The types and amount of gas used vary depending upon the etch process; for instance, sulfur hexafluoride is commonly used for etching silicon. Gas pressure is typically maintained in a range between a few millitorr and a few hundred millitorr by adj ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Reactive-ion Etching
Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it. Equipment A typical (parallel plate) RIE system consists of a cylindrical vacuum chamber, with a wafer platter situated in the bottom portion of the chamber. The wafer platter is electrically isolated from the rest of the chamber. Gas enters through small inlets in the top of the chamber, and exits to the vacuum pump system through the bottom. The types and amount of gas used vary depending upon the etch process; for instance, sulfur hexafluoride is commonly used for etching silicon. Gas pressure is typically maintained in a range between a few millitorr and a few hundred millitorr by adj ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Mass Spectrometry
Mass spectrometry (MS) is an analytical technique that is used to measure the mass-to-charge ratio of ions. The results are presented as a ''mass spectrum'', a plot of intensity as a function of the mass-to-charge ratio. Mass spectrometry is used in many different fields and is applied to pure samples as well as complex mixtures. A mass spectrum is a type of plot of the ion signal as a function of the mass-to-charge ratio. These spectra are used to determine the elemental or isotopic signature of a sample, the masses of particles and of molecules, and to elucidate the chemical identity or structure of molecules and other chemical compounds. In a typical MS procedure, a sample, which may be solid, liquid, or gaseous, is ionized, for example by bombarding it with a beam of electrons. This may cause some of the sample's molecules to break up into positively charged fragments or simply become positively charged without fragmenting. These ions (fragments) are then separated accordin ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Inductively Coupled Plasma Mass Spectrometry
Inductively coupled plasma mass spectrometry (ICP-MS) is a type of mass spectrometry that uses an inductively coupled plasma to ionize the sample. It atomizes the sample and creates atomic and small polyatomic ions, which are then detected. It is known and used for its ability to detect metals and several non-metals in liquid samples at very low concentrations. It can detect different isotopes of the same element, which makes it a versatile tool in isotopic labeling. Compared to atomic absorption spectroscopy, ICP-MS has greater speed, precision, and sensitivity. However, compared with other types of mass spectrometry, such as thermal ionization mass spectrometry (TIMS) and glow discharge mass spectrometry (GD-MS), ICP-MS introduces many interfering species: argon from the plasma, component gases of air that leak through the cone orifices, and contamination from glassware and the cones. Components Inductively coupled plasma An inductively coupled plasma is a plasma that is ener ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Atomic Emission Spectroscopy
Atomic may refer to: * Of or relating to the atom, the smallest particle of a chemical element that retains its chemical properties * Atomic physics, the study of the atom * Atomic Age, also known as the "Atomic Era" * Atomic scale, distances comparable to the dimensions of an atom * Atom (order theory), in mathematics * Atomic (cocktail), a champagne cocktail * Atomic (magazine), ''Atomic'' (magazine), an Australian computing and technology magazine * Atomic Skis, an Austrian ski producer Music * Atomic (band), a Norwegian jazz quintet * Atomic (Lit album), ''Atomic'' (Lit album), 2001 * Atomic (Mogwai album), ''Atomic'' (Mogwai album), 2016 * ''Atomic'', an album by Rockets (band), Rockets, 1982 * Atomic (EP), ''Atomic'' (EP), by , 2013 * Atomic (song), "Atomic" (song), by Blondie, 1979 * "Atomic", a song by Tiger Army from ''Tiger Army III: Ghost Tigers Rise'' See also * * * Atom (other) * Atomicity (database systems) * Nuclear (other) * Atomism, ph ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
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