Ghavam G. Shahidi
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Ghavam G. Shahidi
Ghavam G. Shahidi (born 1959) is an Iranian-American electrical engineer and IBM Fellow. He is the director of Silicon Technology at the IBM Thomas J Watson Research Center. He is best known for his pioneering work in silicon-on-insulator (SOI) complementary metal–oxide–semiconductor (CMOS) technology since the late 1980s. Career He studied electrical engineering at MIT, where he wrote a PhD thesis on "velocity overshoot in deeply scaled MOSFETs" (metal-oxide-semiconductor field-effect transistors), under supervision of Professor Dimitri A. Antoniadis. A 60nanometer silicon MOSFET (metal-oxide-semiconductor field-effect transistor) was fabricated by Shahidi with Antoniadis and Henry I. Smith at MIT in 1986. The device was fabricated using X-ray lithography. Shahidi joined IBM Research in 1989, where he initiated and subsequently led the development of silicon-on-insulator (SOI) complementary metal–oxide–semiconductor (CMOS) technology at IBM. It was called the SOI Res ...
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Iranian-American
Iranian Americans are United States citizens or nationals who are of Iranian ancestry or who hold Iranian citizenship. Iranian Americans are among the most highly educated people in the United States. They have historically excelled in business, academia, science, the arts, and entertainment. Most Iranian Americans arrived in the United States after 1979, as a result of the Iranian Revolution and the fall of the Persian monarchy, with over 40% settling in California, specifically Los Angeles. Unable to return to Iran, they have created many distinct ethnic enclaves, such as the Los Angeles Tehrangeles community. The Iranian American community has become successful, with many becoming doctors, engineers, lawyers, and tech entrepreneurs. Based on a 2012 announcement by the National Organization for Civil Registration, an organization of the Ministry of Interior of Iran, the United States has the highest number of Iranians outside the country. In 2021 the Ministry of Foreign A ...
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MOSFET Scaling
The metal–oxide–semiconductor field-effect transistor (MOSFET, MOS-FET, or MOS FET) is a type of field-effect transistor (FET), most commonly fabricated by the controlled oxidation of silicon. It has an insulated gate, the voltage of which determines the conductivity of the device. This ability to change conductivity with the amount of applied voltage can be used for amplifying or switching electronic signals. A metal-insulator-semiconductor field-effect transistor (MISFET) is a term almost synonymous with MOSFET. Another synonym is IGFET for insulated-gate field-effect transistor. The basic principle of the field-effect transistor was first patented by Julius Edgar Lilienfeld in 1925.Lilienfeld, Julius Edgar (1926-10-08) "Method and apparatus for controlling electric currents" upright=1.6, Two power MOSFETs in V_in_the_''off''_state,_and_can_conduct_a_con­ti­nuous_current_of_30  surface-mount_packages._Operating_as_switches,_each_of_these_components_can_su ...
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Semiconductor
A semiconductor is a material which has an electrical resistivity and conductivity, electrical conductivity value falling between that of a electrical conductor, conductor, such as copper, and an insulator (electricity), insulator, such as glass. Its electrical resistivity and conductivity, resistivity falls as its temperature rises; metals behave in the opposite way. Its conducting properties may be altered in useful ways by introducing impurities ("doping (semiconductor), doping") into the crystal structure. When two differently doped regions exist in the same crystal, a semiconductor junction is created. The behavior of charge carriers, which include electrons, ions, and electron holes, at these junctions is the basis of diodes, transistors, and most modern electronics. Some examples of semiconductors are silicon, germanium, gallium arsenide, and elements near the so-called "metalloid staircase" on the periodic table. After silicon, gallium arsenide is the second-most common s ...
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Immersion Lithography
Immersion lithography is a photolithography resolution enhancement technique for manufacturing integrated circuits (ICs) that replaces the usual air gap between the final lens and the wafer surface with a liquid medium that has a refractive index greater than one. The resolution is increased by a factor equal to the refractive index of the liquid. Current immersion lithography tools use highly purified water for this liquid, achieving feature sizes below 45 nanometers. ASML and Nikon are currently the only manufacturers of immersion lithography systems. History The idea for immersion lithography was patented in 1984 by Takanashi et al. It was also proposed by Taiwanese engineer Burn J. Lin and realized in the 1980s. In 2004, IBM's director of silicon technology, Ghavam Shahidi, announced that IBM planned to commercialize lithography based on light filtered through water. Immersion lithography is now being extended to sub-20nm nodes through the use of multiple patterning. Back ...
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Lithography
Lithography () is a planographic method of printing originally based on the immiscibility of oil and water. The printing is from a stone (lithographic limestone) or a metal plate with a smooth surface. It was invented in 1796 by the German author and actor Alois Senefelder and was initially used mostly for musical scores and maps.Meggs, Philip B. A History of Graphic Design. (1998) John Wiley & Sons, Inc. p 146 Carter, Rob, Ben Day, Philip Meggs. Typographic Design: Form and Communication, Third Edition. (2002) John Wiley & Sons, Inc. p 11 Lithography can be used to print text or images onto paper or other suitable material. A lithograph is something printed by lithography, but this term is only used for fine art prints and some other, mostly older, types of printed matter, not for those made by modern commercial lithography. Originally, the image to be printed was drawn with a greasy substance, such as oil, fat, or wax onto the surface of a smooth and flat limestone plat ...
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Business Week
''Bloomberg Businessweek'', previously known as ''BusinessWeek'', is an American weekly business magazine published fifty times a year. Since 2009, the magazine is owned by New York City-based Bloomberg L.P. The magazine debuted in New York City in September 1929. Bloomberg Businessweek business magazines are located in the Bloomberg Tower, 731 Lexington Avenue, Manhattan in New York City and market magazines are located in the Citigroup Center, 153 East 53rd Street between Lexington and Third Avenue, Manhattan in New York City. History ''Businessweek'' was first published based in New York City in September 1929, weeks before the stock market crash of 1929. The magazine provided information and opinions on what was happening in the business world at the time. Early sections of the magazine included marketing, labor, finance, management and Washington Outlook, which made ''Businessweek'' one of the first publications to cover national political issues that directly impacted the ...
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Low-κ Dielectric
In semiconductor manufacturing, a low-κ is a material with a small relative dielectric constant (κ, kappa) relative to silicon dioxide. Low-κ dielectric material implementation is one of several strategies used to allow continued scaling of microelectronic devices, colloquially referred to as extending Moore's law. In digital circuits, insulating dielectrics separate the conducting parts (wire interconnects and transistors) from one another. As components have scaled and transistors have gotten closer together, the insulating dielectrics have thinned to the point where charge build up and crosstalk adversely affect the performance of the device. Replacing the silicon dioxide with a low-κ dielectric of the same thickness reduces parasitic capacitance, enabling faster switching speeds (in case of synchronous circuits) and lower heat dissipation. In conversation such materials may be referred to as "low-k" (spoken "low-kay") rather than "low-κ" (low-kappa). Low-κ materials In in ...
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130 Nanometer
The 130 nanometer (130 nm) process refers to the level of semiconductor process technology that was reached in the 2000–2001 timeframe, by most leading semiconductor companies, like Intel, Texas Instruments, IBM, and TSMC. The origin of the 130 nm value is historical, as it reflects a trend of 70% scaling every 2–3 years. The naming is formally determined by the International Technology Roadmap for Semiconductors (ITRS). Some of the first CPUs manufactured with this process include Intel Tualatin family of Pentium III processors. Processors using 130 nm manufacturing technology * Motorola PowerPC 7447 and 7457 2002 * IBM Gekko (Nintendo GameCube) * IBM PowerPC G5 970 - October 2002 - June 2003 * Intel Pentium III Tualatin - 2001-06 * Intel Celeron Tualatin-256 - 2001-10-02 * Intel Pentium M Banias - 2003-03-12 * Intel Pentium 4 Northwood - 2002-01-07 * Intel Celeron Northwood-128 - 2002-09-18 * Intel Xeon Prestonia and Gallatin - 2002-02-25 * VIA C3 - 2001 * AMD ...
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RF CMOS
RF CMOS is a metal–oxide–semiconductor (MOS) integrated circuit (IC) technology that integrates radio-frequency (RF), analog and digital electronics on a mixed-signal CMOS (complementary MOS) RF circuit chip. It is widely used in modern wireless telecommunications, such as cellular networks, Bluetooth, Wi-Fi, GPS receivers, broadcasting, vehicular communication systems, and the radio transceivers in all modern mobile phones and wireless networking devices. RF CMOS technology was pioneered by Pakistani engineer Asad Ali Abidi at UCLA during the late 1980s to early 1990s, and helped bring about the wireless revolution with the introduction of digital signal processing in wireless communications. The development and design of RF CMOS devices was enabled by van der Ziel's FET RF noise model, which was published in the early 1960s and remained largely forgotten until the 1990s. History Pakistani engineer Asad Ali Abidi, while working at Bell Labs and then UCLA during the 19 ...
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250 Nanometer
The 250 nanometer (250 nm or 0.25 µm) process refers to a level of semiconductor process technology that was reached by most manufacturers in the 1997–1998 timeframe. Products featuring 250 nm manufacturing process *The DEC Alpha 21264A, which was made commercially available in 1999. *The AMD K6-2 ''Chomper'' and ''Chomper Extended''. Chomper was released on May 28, 1998. *The AMD K6-III "Sharptooth" used 250 nm. *The mobile Pentium MMX ''Tillamook'', released in August 1997. *The Pentium II '' Deschutes''. *The Pentium III '' Katmai''. *The Dreamcast's CPU and GPU. *The initial version of the Emotion Engine processor used in the PlayStation 2 The PlayStation 2 (PS2) is a home video game console developed and marketed by Sony Computer Entertainment. It was first released in Japan on 4 March 2000, in North America on 26 October 2000, in Europe on 24 November 2000, and in Australia on 3 .... *00250 Computer-related introductions in 1998 ...
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AS/400
The IBM AS/400 (Application System/400) is a family of midrange computers from IBM announced in June 1988 and released in August 1988. It was the successor to the System/36 and System/38 platforms, and ran the OS/400 operating system. Lower-cost but more powerful than its predecessors, the AS/400 was extremely successful at launch, with an estimated 111,000 installed by the end of 1990 and annual revenue reaching $14 billion that year, increasing to 250,000 systems by 1994, and about 500,000 shipped by 1997. A key concept in the AS/400 platform is Technology Independent Machine Interface (TIMI), a platform-independent instruction set architecture (ISA) that is compiled along with the native machine language instructions. The platform has used this capability to change the underlying processor architecture without breaking application compatibility. Early systems were based on a 48-bit CISC instruction set architecture known as the ''Internal Microprogrammed Interface'' (IMPI), o ...
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Semiconductor Industry
The semiconductor industry is the aggregate of companies engaged in the design and fabrication of semiconductors and semiconductor devices, such as transistors and integrated circuits. It formed around 1960, once the fabrication of semiconductor devices became a viable business. The industry's annual semiconductor sales revenue has since grown to over , as of 2018. The semiconductor industry is in turn the driving force behind the wider electronics industry, with annual power electronics sales of £135billion () as of 2011, annual consumer electronics sales expected to reach by 2020, tech industry sales expected to reach in 2019, and e-commerce with over in 2017. In 2019, 32.4% of the semiconductor market segment was for networks and communications devices. In 2021, the sales of semiconductors reached a record $555.9 billion, up 26.2 percent with sales in China reaching $192.5 billion, according to the Semiconductor Industry Association. A record 1.15 trillion semiconduct ...
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