Arunava Gupta
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Arunava Gupta
Arunava Gupta from the IBM T.J. Watson Research Center, was awarded the status of Fellow in the American Physical Society The American Physical Society (APS) is a not-for-profit membership organization of professionals in physics and related disciplines, comprising nearly fifty divisions, sections, and other units. Its mission is the advancement and diffusion of k ..., after he was nominated by the Division of Materials Physics in 1998, for contributions to the development of pulsed laser deposition techniques, the use of this technique for the production of materials with novel physical properties, and for original contributions to the understanding of nonequilibrium film-growth mechanisms. References External links * http://mint.ua.edu/faculty_member/gupta-arunava/ Fellows of the American Physical Society American physicists Living people Year of birth missing (living people) {{Physicist-stub ...
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American Physical Society
The American Physical Society (APS) is a not-for-profit membership organization of professionals in physics and related disciplines, comprising nearly fifty divisions, sections, and other units. Its mission is the advancement and diffusion of knowledge of physics. The society publishes more than a dozen scientific journals, including the prestigious '' Physical Review'' and ''Physical Review Letters'', and organizes more than twenty science meetings each year. APS is a member society of the American Institute of Physics. Since January 2021 the organization has been led by chief executive officer Jonathan Bagger. History The American Physical Society was founded on May 20, 1899, when thirty-six physicists gathered at Columbia University for that purpose. They proclaimed the mission of the new Society to be "to advance and diffuse the knowledge of physics", and in one way or another the APS has been at that task ever since. In the early years, virtually the sole activity of the AP ...
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Pulsed Laser Deposition
Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited. This material is vaporized from the target (in a plasma plume) which deposits it as a thin film on a substrate (such as a silicon wafer facing the target). This process can occur in ultra high vacuum or in the presence of a background gas, such as oxygen which is commonly used when depositing oxides to fully oxygenate the deposited films. While the basic setup is simple relative to many other deposition techniques, the physical phenomena of laser-target interaction and film growth are quite complex (see Process below). When the laser pulse is absorbed by the target, energy is first converted to electronic excitation and then into thermal, chemical and mechanical energy resulting in evaporation, ablation, plasma formation and even exfoliation.Pulsed Laser Deposition of Thin F ...
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